Handbook of semiconductor wafer cleaning technology science, technology, and applications

Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field.

Saved in:
Bibliographic Details
Other Authors: Kern, Werner, 1925-
Format: eBook
Language: English
Published: Park Ridge, N.J., U.S.A. : Noyes Publications, c1993.
Series: Materials science and process technology series. Electronic materials and process technology.
Subjects:
Semiconductor wafers > Cleaning.
elektronické knihy
electronic books
ISBN: 9781591240938
9780815513315
Physical Description: 1 online zdroj (xx, 623 p.) : ill.

Cover

Table of contents

LEADER 02462cam a2200409 a 4500
001 78820
003 CZ ZlUTB
005 20240911214526.0
006 m o d
007 cr |n
008 011108s1993 njua sbf 001 0 eng d
020 |a 9781591240938  |q (ebook) 
020 |a 9780815513315 
035 |a (OCoLC)49708232  |z (OCoLC)49270483  |z (OCoLC)301111620  |z (OCoLC)621623948  |z (OCoLC)639755355 
040 |a KNOVL  |b eng  |c KNOVL  |d OCLCQ  |d TEF  |d OCLCG  |d DEBSZ  |d OCLCQ  |d KNOVL  |d OCLCO  |d ZCU  |d KNOVL  |d OCLCF  |d OCLCE  |d UWW  |d KNOVL 
245 0 0 |a Handbook of semiconductor wafer cleaning technology  |h [elektronický zdroj] :  |b science, technology, and applications /  |c edited by Werner Kern. 
260 |a Park Ridge, N.J., U.S.A. :  |b Noyes Publications,  |c c1993. 
300 |a 1 online zdroj (xx, 623 p.) :  |b ill. 
336 |a text  |b txt  |2 rdacontent 
337 |a počítač  |b c  |2 rdamedia 
338 |a online zdroj  |b cr  |2 rdacarrier 
490 1 |a Materials science and process technology series. Electronic materials and process technology 
520 |a Discusses semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. Intended to serve as a handbook for practitioners and professionals in the field. 
504 |a Includes bibliographical references and index. 
505 0 |a 12. Ultratrace Impurity Analysis of Silicon Surfaces by SIMS and TXRF Methods / Richard S. Hockett -- 13. Future Directions / Werner Kern. 
590 |a Knovel Library  |b ACADEMIC - Electronics & Semiconductors 
506 |a Plný text je dostupný pouze z IP adres počítačů Univerzity Tomáše Bati ve Zlíně nebo vzdáleným přístupem pro zaměstnance a studenty univerzity 
650 0 |a Semiconductor wafers  |x Cleaning. 
655 7 |a elektronické knihy  |7 fd186907  |2 czenas 
655 9 |a electronic books  |2 eczenas 
700 1 |a Kern, Werner,  |d 1925- 
776 0 8 |i Print version:  |t Handbook of semiconductor wafer cleaning technology.  |d Park Ridge, N.J., U.S.A. : Noyes Publications, c1993  |z 0815513313  |w (DLC) 93004078  |w (OCoLC)27976222 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
856 4 0 |u https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpHSWCTSTB/handbook_of_semiconductor_wafer_cleaning_technology__science_technology_and_applications  |y Plný text 
992 |a BK  |c KNOVEL 
999 |c 78820  |d 78820 
993 |x NEPOSILAT  |y EIZ 

Similar Items