Handbook of silicon wafer cleaning technology

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with...

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Bibliographic Details
Other Authors Reinhardt, Karen A., Kern, Werner, 1925-
Format Electronic eBook
LanguageEnglish
Published Norwich, NY : William Andrew, ©2008.
Edition2nd ed.
SeriesMaterials science and process technology series.
Subjects
Silicon-on-insulator technology.
elektronické knihy
electronic books
Online AccessFull text
ISBN9780815517733
9780815515548
9780815517719
Physical Description1 online zdroj (xxvi, 718 pages) : illustrations.

Cover

Table of Contents:
  • Part 1: Introduction and Overview
  • Overview and Evolution of Silicon Wafer Cleaning Technology
  • Overview of Wafer Contamination and Defectivity
  • Part 2: Wet-Chemical Processes
  • Particle Deposition and Adhesion
  • Aqueous Cleaning and Surface Conditioning Processes
  • Part 3: Dry Cleaning Processes
  • Gas-phase Wafer Cleaning Technology
  • Plasma Stripping and Cleaning
  • Cryogenic Aerosols and Supercritical Fluid Cleaning
  • Part 4: Analytical and Control Aspects
  • Detection and Measurement of Particulate Contaminants
  • Surface Chemical Composition and Morphology
  • Ultratrace Impurity and Surface Morphology Analysis
  • Analysis and Control of Electrically Active Contaminants
  • Part 5: Directions for the Near Future.

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