Predictive Multi-Stage Modelling for Complex Process Control

• Format: Patent
• Language: English
• Published: 13.08.2019

Predictive multi-stage modelling for complex semiconductor device manufacturing process control is provided. In one aspect, a method of predictive multi-stage modelling for controlling a complex semiconductor device manufacturing process includes: collecting geometrical data from metrology measurements made at select stages of the manufacturing process; and making an outcome probability prediction at each of the select stages using a multiplicative kernel Gaussian process, wherein the outcome probability prediction is a function of a current stage and all prior stages. Machine-learning models can be trained for each of the select stages of the manufacturing process using the multiplicative kernel Gaussian process. The machine-learning models can be used to provide probabilistic predictions for a final outcome in real-time for production wafers. The probabilistic predictions can then be used to select production wafers for rework, sort, scrap or disposition.