沉积温度对MOCVD法制备固体氧化物燃料电池GDC阻挡层性质的影响
O484%TM911.4; 致密的氧化钆掺杂的氧化铈(GDC)薄膜可以被应用于固体氧化物燃料电池(SOFC)的阴极LSCF与电解质YSZ的阻挡层,防止绝缘相SrZrO3的生成,从而提高电池的耐久性.本文以四(2,2,6,6-四甲基-3,5-庚二酮)铈(Ce(DPM)4)和三(2,2,6,6-四甲基-3,5-庚二酮)钆(Gd(DPM)3)为前驱体,采用智能化学气相沉积设备在723～923 K在YSZ陶瓷基板表面制备GDC薄膜,并研究了不同沉积温度对GDC薄膜的相组成、择优取向、宏观表面、微观结构和电化学性能的影响.在748～923 K时制备了具有(200)择优取向的淡黄色GDC薄膜,且GDC晶粒...
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| Published in | 人工晶体学报 Vol. 53; no. 12; pp. 2197 - 2204 |
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| Main Authors | , , , |
| Format | Journal Article |
| Language | Chinese |
| Published |
武汉工程大学化工与制药学院,绿色化工过程教育部重点实验室,武汉 430205
15.12.2024
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1000-985X |
| DOI | 10.3969/j.issn.1000-985X.2024.12.020 |
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| Abstract | O484%TM911.4; 致密的氧化钆掺杂的氧化铈(GDC)薄膜可以被应用于固体氧化物燃料电池(SOFC)的阴极LSCF与电解质YSZ的阻挡层,防止绝缘相SrZrO3的生成,从而提高电池的耐久性.本文以四(2,2,6,6-四甲基-3,5-庚二酮)铈(Ce(DPM)4)和三(2,2,6,6-四甲基-3,5-庚二酮)钆(Gd(DPM)3)为前驱体,采用智能化学气相沉积设备在723～923 K在YSZ陶瓷基板表面制备GDC薄膜,并研究了不同沉积温度对GDC薄膜的相组成、择优取向、宏观表面、微观结构和电化学性能的影响.在748～923 K时制备了具有(200)择优取向的淡黄色GDC薄膜,且GDC晶粒呈岛状生长模式.在873 K时得到了阻挡效果良好的(200)择优取向的淡黄色GDC薄膜.组装LSCF/GDC/YSZ/GDC/LSCF对称电池,在1 073 K下测得电池阻抗为0.08 Ω·cm2,活化能为1.52 eV,表明873 K为化学气相沉积法制备GDC薄膜的最佳沉积温度. |
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| AbstractList | O484%TM911.4; 致密的氧化钆掺杂的氧化铈(GDC)薄膜可以被应用于固体氧化物燃料电池(SOFC)的阴极LSCF与电解质YSZ的阻挡层,防止绝缘相SrZrO3的生成,从而提高电池的耐久性.本文以四(2,2,6,6-四甲基-3,5-庚二酮)铈(Ce(DPM)4)和三(2,2,6,6-四甲基-3,5-庚二酮)钆(Gd(DPM)3)为前驱体,采用智能化学气相沉积设备在723～923 K在YSZ陶瓷基板表面制备GDC薄膜,并研究了不同沉积温度对GDC薄膜的相组成、择优取向、宏观表面、微观结构和电化学性能的影响.在748～923 K时制备了具有(200)择优取向的淡黄色GDC薄膜,且GDC晶粒呈岛状生长模式.在873 K时得到了阻挡效果良好的(200)择优取向的淡黄色GDC薄膜.组装LSCF/GDC/YSZ/GDC/LSCF对称电池,在1 073 K下测得电池阻抗为0.08 Ω·cm2,活化能为1.52 eV,表明873 K为化学气相沉积法制备GDC薄膜的最佳沉积温度. |
| Abstract_FL | The compact Gd-doped ceria(GDC)film can be applied to the barrier layer between the cathode LSCF and the electrolyte YSZ of solid oxide fuel cell(SOFC)to prevent the formation of the insulating phase SrZrO3,thereby improving the fuel cell durability.In this paper,four(2,2,6,6-tetramethyl-3,5-heptadione)cerium(Ce(DPM)4)and three(2,2,6,6-tetramethyl-3,5-heptadione)gadolinium(Gd(DPM)3)were used as precursor,GDC barrier films were prepared on YSZ ceramic substrates using intelligent chemical vapor deposition equipment at 723～923 K.Effects of deposition temperatures on the phase composition,preferred orientation,macroscopic surface,microstructure and electrochemical properties of GDC barrier films were investigated,respectively.Light yellow GDC films with(200)preferred orientation are obtained at 748～923 K,and the GDC grains show an island growth pattern.A(200)preferred orientation light yellow GDC film with the best blocking ability is prepared at 873 K.The measured impedance of the LSCF/GDC/YSZ/GDC/LSCF fuel cell at 1 073 K is 0.08 Ω·cm2,and the activation energy is 1.52 eV,indicating that 873 K is the best deposition temperature for GDC barrier film preparation using chemical vapor deposition. |
| Author | 徐源来 马超 赵培 熊春艳 |
| AuthorAffiliation | 武汉工程大学化工与制药学院,绿色化工过程教育部重点实验室,武汉 430205 |
| AuthorAffiliation_xml | – name: 武汉工程大学化工与制药学院,绿色化工过程教育部重点实验室,武汉 430205 |
| Author_FL | XU Yuanlai MA Chao XIONG Chunyan ZHAO Pei |
| Author_FL_xml | – sequence: 1 fullname: MA Chao – sequence: 2 fullname: XIONG Chunyan – sequence: 3 fullname: XU Yuanlai – sequence: 4 fullname: ZHAO Pei |
| Author_xml | – sequence: 1 fullname: 马超 – sequence: 2 fullname: 熊春艳 – sequence: 3 fullname: 徐源来 – sequence: 4 fullname: 赵培 |
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| ClassificationCodes | O484%TM911.4 |
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| Copyright | Copyright © Wanfang Data Co. Ltd. All Rights Reserved. |
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| DOI | 10.3969/j.issn.1000-985X.2024.12.020 |
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| DocumentTitle_FL | Effect of Deposition Temperature on the Property of Solid Oxide Fuel Cell GDC Barrier Layer Prepared by Metal-Organic Chemical Vapor Deposition |
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| Keywords | 金属有机物化学气相沉积 固体氧化物燃料电池 deposition temperature metal-organic chemical vapor deposition solid oxide fuel cell gadolinium doped ceria 沉积温度 氧化钆掺杂氧化铈 |
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| Title | 沉积温度对MOCVD法制备固体氧化物燃料电池GDC阻挡层性质的影响 |
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