Very fast hot carrier diffusion in unconstrained MoS2 on a glass substrate: discovered by picosecond ET-Raman

The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffu...

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Published inRSC advances Vol. 8; no. 23; pp. 12767 - 12778
Main Authors Yuan, Pengyu, Tan, Hong, Wang, Ridong, Wang, Tianyu, Wang, Xinwei
Format Journal Article
LanguageEnglish
Published Cambridge Royal Society of Chemistry 03.04.2018
The Royal Society of Chemistry
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ISSN2046-2069
2046-2069
DOI10.1039/c8ra01106k

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Abstract The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s−1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V−1 s−1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies.
AbstractList The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V-1 s-1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8-18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s-1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V-1 s-1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies.The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V-1 s-1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8-18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s-1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V-1 s-1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies.
The currently reported optical-phonon-scattering-limited carrier mobility of MoS₂ is up to 417 cm² V⁻¹ s⁻¹ with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS₂ (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS₂. The measured D values span from 0.76 to 9.7 cm² s⁻¹. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm² V⁻¹ s⁻¹. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS₂ that is superior to those of MoS₂ samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies.
The currently reported optical-phonon-scattering-limited carrier mobility of MoS 2 is up to 417 cm 2 V −1 s −1 with two-side dielectric screening: one normal- κ side and one high- κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS 2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal- κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS 2 . The measured D values span from 0.76 to 9.7 cm 2 s −1 . A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm 2 V −1 s −1 . This mobility is surprisingly high considering the normal- κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS 2 that is superior to those of MoS 2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies. Very high nonmonotonic thickness-dependent hot carrier diffusivity of MoS 2 in a normal- κ dielectric screening environment was discovered by ET-Raman technique.
The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s−1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V−1 s−1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies.
Author Wang, Tianyu
Yuan, Pengyu
Wang, Xinwei
Tan, Hong
Wang, Ridong
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These authors contributed equally to this work.
271 Applied Science Complex II, Department of Mechanical Engineering, Iowa State University, Ames, IA 50011, USA.
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Snippet The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ...
The currently reported optical-phonon-scattering-limited carrier mobility of MoS₂ is up to 417 cm² V⁻¹ s⁻¹ with two-side dielectric screening: one normal-κ...
The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V-1 s-1 with two-side dielectric screening: one normal-κ...
The currently reported optical-phonon-scattering-limited carrier mobility of MoS 2 is up to 417 cm 2 V −1 s −1 with two-side dielectric screening: one normal-...
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StartPage 12767
SubjectTerms Carrier density
Carrier mobility
Chemistry
Current carriers
Dielectric strength
Diffusion rate
energy
Energy consumption
glass
Glass substrates
Molybdenum disulfide
physical phenomena
Post-processing
Screening
Structural damage
Title Very fast hot carrier diffusion in unconstrained MoS2 on a glass substrate: discovered by picosecond ET-Raman
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