Very fast hot carrier diffusion in unconstrained MoS2 on a glass substrate: discovered by picosecond ET-Raman
The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffu...
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Published in | RSC advances Vol. 8; no. 23; pp. 12767 - 12778 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Cambridge
Royal Society of Chemistry
03.04.2018
The Royal Society of Chemistry |
Subjects | |
Online Access | Get full text |
ISSN | 2046-2069 2046-2069 |
DOI | 10.1039/c8ra01106k |
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Abstract | The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s−1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V−1 s−1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies. |
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AbstractList | The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V-1 s-1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8-18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s-1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V-1 s-1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies.The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V-1 s-1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8-18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s-1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V-1 s-1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies. The currently reported optical-phonon-scattering-limited carrier mobility of MoS₂ is up to 417 cm² V⁻¹ s⁻¹ with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS₂ (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS₂. The measured D values span from 0.76 to 9.7 cm² s⁻¹. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm² V⁻¹ s⁻¹. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS₂ that is superior to those of MoS₂ samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies. The currently reported optical-phonon-scattering-limited carrier mobility of MoS 2 is up to 417 cm 2 V −1 s −1 with two-side dielectric screening: one normal- κ side and one high- κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS 2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal- κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS 2 . The measured D values span from 0.76 to 9.7 cm 2 s −1 . A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm 2 V −1 s −1 . This mobility is surprisingly high considering the normal- κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS 2 that is superior to those of MoS 2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies. Very high nonmonotonic thickness-dependent hot carrier diffusivity of MoS 2 in a normal- κ dielectric screening environment was discovered by ET-Raman technique. The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ side and one high-κ side. Herein, using picosecond energy transport state-resolved Raman (ET-Raman), we demonstrated very fast hot carrier diffusion in μm-scale (lateral) unconstrained MoS2 (1.8–18 nm thick) on a glass substrate; this method enables only one-side normal-κ dielectric screening. The ET-Raman method directly probes the diffusion of the hot carrier and its contribution to phonon transfer without contact and additional sample preparation and provides unprecedented insight into the intrinsic D of MoS2. The measured D values span from 0.76 to 9.7 cm2 s−1. A nonmonotonic thickness-dependent D trend is discovered, and it peaks at 3.0 nm thickness. This is explained by the competition between two physical phenomena: with an increase in sample thickness, the increased screening of the substrate results in higher mobility; moreover, thicker samples are subject to more surface contamination, loose substrate contact and weaker substrate dielectric screening. The corresponding carrier mobility varies from 31.0 to 388.5 cm2 V−1 s−1. This mobility is surprisingly high considering the normal-κ and single side dielectric screening by the glass substrate. This is a direct result of the less-damaged structure of MoS2 that is superior to those of MoS2 samples reported in literature studies that are subjected to various post-processing techniques to facilitate measurement. The very high hot carrier mobility reduces the local carrier concentration and enhances the Raman signal, which is further confirmed by our Raman signal studies and comparison with theoretical studies. |
Author | Wang, Tianyu Yuan, Pengyu Wang, Xinwei Tan, Hong Wang, Ridong |
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Copyright | Copyright Royal Society of Chemistry 2018 This journal is © The Royal Society of Chemistry. This journal is © The Royal Society of Chemistry 2018 The Royal Society of Chemistry |
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Notes | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 content type line 23 These authors contributed equally to this work. 271 Applied Science Complex II, Department of Mechanical Engineering, Iowa State University, Ames, IA 50011, USA. |
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Snippet | The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V−1 s−1 with two-side dielectric screening: one normal-κ... The currently reported optical-phonon-scattering-limited carrier mobility of MoS₂ is up to 417 cm² V⁻¹ s⁻¹ with two-side dielectric screening: one normal-κ... The currently reported optical-phonon-scattering-limited carrier mobility of MoS2 is up to 417 cm2 V-1 s-1 with two-side dielectric screening: one normal-κ... The currently reported optical-phonon-scattering-limited carrier mobility of MoS 2 is up to 417 cm 2 V −1 s −1 with two-side dielectric screening: one normal-... |
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StartPage | 12767 |
SubjectTerms | Carrier density Carrier mobility Chemistry Current carriers Dielectric strength Diffusion rate energy Energy consumption glass Glass substrates Molybdenum disulfide physical phenomena Post-processing Screening Structural damage |
Title | Very fast hot carrier diffusion in unconstrained MoS2 on a glass substrate: discovered by picosecond ET-Raman |
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