Image Simulation and Analysis

No image is perfect, except for paintings. We have to deal with various noise sources and image sensor artifacts as well as with diffraction and other geometrical effects. The simulation of such artifacts is a great help during a design process and a perfect method for proof of concepts: Without acc...

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Published inOptik & Photonik (Internet) Vol. 13; no. 3; pp. 36 - 39
Main Author Sengebusch, Karsten
Format Journal Article
LanguageEnglish
German
Published Weinheim Wiley Subscription Services, Inc 01.06.2018
Subjects
Computer simulation
Electronic systems
Forensic engineering
Hardware
Holograms
Holography
Simulation
Statistical analysis
Statistical methods
Wave diffraction
Wave propagation
Online AccessGet full text
ISSN1863-1460
2191-1975
2191-1975
DOI10.1002/opph.201800012

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Abstract No image is perfect, except for paintings. We have to deal with various noise sources and image sensor artifacts as well as with diffraction and other geometrical effects. The simulation of such artifacts is a great help during a design process and a perfect method for proof of concepts: Without access to any real hardware it is possible to predict and visualize the performance of opto‐electronic systems. Algorithms for correction or analysis of image data can be developed and evaluated a long time before the imaging hardware is ready to use. The statistical methods used during the simulation process can also be used reversely to provide a deep statistical analysis of already existing images. Such an analysis as well as the comparison with simulated images can help to identify the source of artifacts and design mistakes or even be used during forensic work. Last but not least, the reverse usage of the simulation of diffraction and wave front propagation is a very effective method for the generation of computer generated holograms or DOEs.
AbstractList No image is perfect, except for paintings.We have to deal with various noise sources and image sensor artifacts as well as with diffraction and other geometrical effects. The simulation of such artifacts is a great help during a design process and a perfect method for proof of concepts: Without access to any real hardware it is possible to predict and visualize the performance of opto‐electronic systems.Algorithms for correction or analysis of image data can be developed and evaluated a long time before the imaging hardware is ready to use. The statistical methods used during the simulation process can also be used reversely to provide a deep statistical analysis of already existing images. Such an analysis as well as the comparison with simulated images can help to identify the source of artifacts and design mistakes or even be used during forensic work.Last but not least, the reverse usage of the simulation of diffraction and wave front propagation is a very effective method for the generation of computer generated holograms or DOEs.
No image is perfect, except for paintings. We have to deal with various noise sources and image sensor artifacts as well as with diffraction and other geometrical effects. The simulation of such artifacts is a great help during a design process and a perfect method for proof of concepts: Without access to any real hardware it is possible to predict and visualize the performance of opto‐electronic systems. Algorithms for correction or analysis of image data can be developed and evaluated a long time before the imaging hardware is ready to use. The statistical methods used during the simulation process can also be used reversely to provide a deep statistical analysis of already existing images. Such an analysis as well as the comparison with simulated images can help to identify the source of artifacts and design mistakes or even be used during forensic work. Last but not least, the reverse usage of the simulation of diffraction and wave front propagation is a very effective method for the generation of computer generated holograms or DOEs.
Author Sengebusch, Karsten
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Notes Karsten Sengebusch
studied experimental physics at the university of Cologne and led a laboratory for experimental holography there. 1997 he co‐founded the company Eureca Messtechnik GmbH in Cologne. There he is the specialist for customized CCD and CMOS sensors, image simulation and processing, application analysis, and certificates
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SubjectTerms Computer simulation
Electronic systems
Forensic engineering
Hardware
Holograms
Holography
Simulation
Statistical analysis
Statistical methods
Wave diffraction
Wave propagation
Title Image Simulation and Analysis
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