원자층 증착법에 의한 TiO₂, Al₂O₃, 및 TiO₂-Al₂O₃ 나노라미네이트 박막이 316L Stainless Steel의 부식특성에 미치는 영향

• Published in: Biuletyn Uniejowski Vol. 50; no. 1; pp. 35 - 41
• Main Authors: 이우재(Woo-Jae Lee), 만지흠(Zhixin Wan), 김다영(Da Young Kim), 장경수(Kyung Su Jang), 최현진(Hyun-Jin Choi), 최우창(Woo-Chang-Choi), 권세훈(Se Hun Kwon)
• Format: Journal Article
• Language: Korean
• Published: 한국표면공학회 01.02.2017
• Subjects: 기계공학; Corrosion resistance; TiO; Al₂O; Atomic layer deposition; TiO₂-Al₂O
• ISSN: 1225-8024; 2299-8403; 2288-8403
• DOI: 10.5695/JKISE.2017.50.1.35

TiO2, Al2O3, and TiO2-Al2O3 nanolaminated films were grown by atomic layer deposition (ALD) on the 316L stainless steel (SS316L) substrates at a temperature of 150 ºC. The growth kinetics of ALD-TiO2 and Al2O3 thin films were systematically investigated in order to precisely control the thickness of each layers in the TiO2-Al2O3 nanolaminated films using a high-resolution transmission electron microscopy. And, the exact deposition rates of ALD-TiO2 on Al2O3 surface and ALD-Al2O3 on TiO2 surface were revealed to be 0.0284 nm/cycle and 0.11 nm/cycle, respectively. At given growth conditions, the microstructures of TiO2, Al2O3 and TiO2-Al2O3 nanolaminated films were amorphous. The potentiodynamic polarization test revealed that the TiO2-Al2O3 nanolaminated film coated SS316L had a best corrosion resistance, although all ALDcoated SS316L exhibited a clear improvement of the corrosion resistance compared with a bare SS316L. KCI Citation Count: 0