ALD-Al₂O₃ 보호층이 적용된 CrAlSiN 코팅막의 내부식성 특성에 관한 연구

• Published in: Biuletyn Uniejowski Vol. 50; no. 5; pp. 339 - 344
• Main Authors: 만지흠(Zhixin Wan), 이우재(Woo-Jae Lee), 장경수(Kyung Su Jang), 최현진(Hyun-Jin Choi), 권세훈(Se Hun Kwon)
• Format: Journal Article
• Language: Korean
• Published: 한국표면공학회 01.10.2017
• Subjects: 기계공학; Atomic layer deposition; Corrosion; CrAlSiN hard coatings; Passivation layer
• ISSN: 1225-8024; 2299-8403; 2288-8403
• DOI: 10.5695/JKISE.2017.50.5.339

Highly corrosion resistance performance of CrAlSiN coatings were obtained by applying ultrathin Al2O3 thin films using atomic layer deposition (ALD) method. CrAlSiN coatings were prepared on Cr adhesion layer/SUS304 substrates by a hybrid coating system of arc ion plating and high power impulse magnetron sputtering (HiPIMS) method. And, ultrathin Al2O3 passivation layer was deposited on the CrAlSiN/Cr adhesion layer/SUS304 sample to protect CrAlSiN coatings by encapsulating the whole surface defects of coating using ALD. Here, the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and energy dispersive X-ray spectrometry (EDX) analysis revealed that the ALD Al2O3 thin films uniformly covered the inner and outer surface of CrAlSiN coatings. Also, the potentiodynamic and potentiostatic polarization test revealed that the corrosion protection properties of CrAlSiN coatings/Cr/SUS304 sample was greatly improved by ALD encapsulation with 50 nm-thick Al2O3 thin films, which implies that ALD-Al2O3 passivation layer can be used as an effect barrier layer of corrosion. KCI Citation Count: 0