Maher, M. J., Self, J. L., Stasiak, P., Blachut, G., Ellison, C. J., Matsen, M. W., . . . Willson, C. G. (2016). Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films. ACS nano, 10(11), 10152. https://doi.org/10.1021/acsnano.6b05390
Chicago Style (17th ed.) CitationMaher, Michael J., Jeffrey L. Self, Pawel Stasiak, Gregory Blachut, Christopher J. Ellison, Mark W. Matsen, Christopher M. Bates, and C Grant Willson. "Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films." ACS Nano 10, no. 11 (2016): 10152. https://doi.org/10.1021/acsnano.6b05390.
MLA (9th ed.) CitationMaher, Michael J., et al. "Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films." ACS Nano, vol. 10, no. 11, 2016, p. 10152, https://doi.org/10.1021/acsnano.6b05390.