Thickness measurement of nm HfO2 films - Kim, K J; Kim, A; Kim, C S; Song, S W; Ruh, H; Unger, W E S; Radnik, J; Mata-Salazar, J; Juarez-Garcia, J M; Cortazar-Martinez, O; Herrera-Gomez, A; Hansen, P E; et al. (Metrologia, 2021)
Keywords: Attenuation; Backscattering; Hafnium oxide; Ion scattering; Ion scattering spectroscopy; Photoelectrons; Spectroellipsometry; Surface analysis (chemical); Thickness measurement; X ray fluorescence analysis; X ray photoelectron spectroscopy