Real time evaluation of an air leak into a dry etching equipment by means of optical emission spectroscopy: evaluation and results in high volume production regime - Ciovacco, F.; Alba, S.; Fazio, G.; Somboli, F. (Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI, 2003)
Keywords: Automatic testing; Dry etching; Frequency; Inductors; Performance evaluation; Plasma applications; Plasma diagnostics; Production; Spectroscopy; Stimulated emission