APA (7th ed.) Citation

Ciovacco, F., Alba, S., Fazio, G., & Somboli, F. (2003). Real time evaluation of an air leak into a dry etching equipment by means of optical emission spectroscopy: Evaluation and results in high volume production regime. Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI, 73-74. https://doi.org/10.1109/ASMC.2003.1194470

Chicago Style (17th ed.) Citation

Ciovacco, F., S. Alba, G. Fazio, and F. Somboli. "Real Time Evaluation of an Air Leak into a Dry Etching Equipment by Means of Optical Emission Spectroscopy: Evaluation and Results in High Volume Production Regime." Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI 2003: 73-74. https://doi.org/10.1109/ASMC.2003.1194470.

MLA (9th ed.) Citation

Ciovacco, F., et al. "Real Time Evaluation of an Air Leak into a Dry Etching Equipment by Means of Optical Emission Spectroscopy: Evaluation and Results in High Volume Production Regime." Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI, 2003, pp. 73-74, https://doi.org/10.1109/ASMC.2003.1194470.