Chemical dry cleaning technology for reliable 65 nm CMOS contact to NiSi/sub x - Honda, M.; Tsutsumi, K.; Harakawa, H.; Nomachi, A.; Murakami, K.; Ooya, K.; Kudou, T.; Nagamatsu, T.; Ezawa, H. (Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005, 2005)
Keywords: Chemical technology; Cleaning; CMOS technology; Contact resistance; Manufacturing; Metallization; Nickel; Silicides; Surface resistance; Surface treatment