Ruthenium interconnects with 58 nm2 cross-section area using a metal-spacer process - Dutta, Shibesh; Kundu, Shreya; Lianggong Wen; Jamieson, Geraldine; Croes, Kristof; Gupta, Anshul; Bommels, Jurgen; Wilson, Christopher J.; Adelmann, Christoph; Tokei, Zsolt (Proceedings of the IEEE International Interconnect Technology Conference, 2017)
Keywords: Conductivity; Current density; Electrical resistance measurement; interconnects; metallic spacer; Metals; Nanowires; Resistance; Ruthenium; Temperature measurement