(2008, January). Electron-beam-patterning simulation and metrology of complex layouts on Si/Mo multilayer substrates. Proceedings of SPIE, the international society for optical engineering. https://doi.org/10.1117/12.769392
Chicago Style (17th ed.) Citation"Electron-beam-patterning Simulation and Metrology of Complex Layouts on Si/Mo Multilayer Substrates." Proceedings of SPIE, the International Society for Optical Engineering Jan. 2008. https://doi.org/10.1117/12.769392.
MLA (9th ed.) Citation"Electron-beam-patterning Simulation and Metrology of Complex Layouts on Si/Mo Multilayer Substrates." Proceedings of SPIE, the International Society for Optical Engineering, Jan. 2008, https://doi.org/10.1117/12.769392.
Warning: These citations may not always be 100% accurate.