基于光学读出非制冷红外成像系统的无基底FPA等效电学模型
TN216; 与传统的有基底FPA(焦平面阵列)相比,基于全镂空支撑框架结构的新型无基底FPA在热学特性上存在显著差异,传统的基于恒温基底假设的热学分析模型不再适用,因此,通过电学比拟方法,将无基底FPA的热响应特性等效为电学模型.通过该模型,进一步分析了无基底FPA在非真空环境下的热学性能,分析表明:该无基底FPA具有在大气压下优良的红外成像性能,其NETD(噪声等效温度差)值仅比真空环境下增加了数倍....
Saved in:
| Published in | 红外与毫米波学报 Vol. 32; no. 5; pp. 394 - 399 |
|---|---|
| Main Author | |
| Format | Journal Article |
| Language | Chinese |
| Published |
中国科学技术大学中国科学院材料力学行为和设计重点实验室,安徽合肥,230027%中国科学院微电子研究所,北京,100029
2013
|
| Subjects | |
| Online Access | Get full text |
| ISSN | 1001-9014 |
| DOI | 10.3724/SP.J.1010.2013.00394 |
Cover
| Summary: | TN216; 与传统的有基底FPA(焦平面阵列)相比,基于全镂空支撑框架结构的新型无基底FPA在热学特性上存在显著差异,传统的基于恒温基底假设的热学分析模型不再适用,因此,通过电学比拟方法,将无基底FPA的热响应特性等效为电学模型.通过该模型,进一步分析了无基底FPA在非真空环境下的热学性能,分析表明:该无基底FPA具有在大气压下优良的红外成像性能,其NETD(噪声等效温度差)值仅比真空环境下增加了数倍. |
|---|---|
| Bibliography: | Thermal characteristics of new substrate-free FPA (focal plane array) with full hollow supporting frame struc- ture are very different from that of traditional substrate FPA. The thermal analysis model which based on temperature- constant substrate assumption is not efficient any more. Therefore, an equivalent circuit model was presented to analyze the thermal response characteristics of substrate-free FPA with electrics and holistic approach. According to this model, the thermal characteristics of substrate-free FPA under non-vacuum environment were analyzed. The result shows that, the substrate-free FPA has excellent infrared imaging performances under atmospheric pressure, while its NETD (noise equivalent temperature difference) is just increased several times than in the vacuum environment. 31-1577/TN ZHANG Yong, CHENG Teng ZHANG Qing-Chuan CHEN Da-Peng GAO Jie, MAO Liang , WU Jian-Xiong , GAO Yue ( 1. CAS Key Laboratory of Mechanical Behavior and Design of Materials, University of Science and Technology of |
| ISSN: | 1001-9014 |
| DOI: | 10.3724/SP.J.1010.2013.00394 |