Process Variability—Technological Challenge and Design Issue for Nanoscale Devices - Lorenz, Jürgen; Bär, Eberhard; Barraud, Sylvain; Brown, Andrew R.; Evanschitzky, Peter; Klüpfel, Fabian; Wang, Liping (Micromachines (Basel), 2019)
Keywords: Circuits; compact models; Computer architecture; Defects; device simulation; Engineering Sciences; Etching; FinFETs; nanosheets; Nanotechnology devices; Nanowires; Optimization; process simulation; process variations; Semiconductor devices; Simulation; statistical variations; systematic variations; Transistors; nanowires; process variations; statistical variations; FinFETs; device simulation; process simulation; compact models; systematic variations; nanosheets