Substrate dependence of CsK2Sb photo-cathode performance
A photo-cathode able to generate a high-performance electron beam with large operability is one of the most important devices in an advanced accelerator. In particular, the $\rm CsK_2Sb$ photo-cathode is of interest because it has high robustness and can be driven by visible light. In this study, we...
Saved in:
Published in | Progress of theoretical and experimental physics Vol. 2017; no. 3 |
---|---|
Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Oxford
Oxford University Press
01.03.2017
|
Subjects | |
Online Access | Get full text |
ISSN | 2050-3911 2050-3911 |
DOI | 10.1093/ptep/ptx030 |
Cover
Summary: | A photo-cathode able to generate a high-performance electron beam with large operability is one of the most important devices in an advanced accelerator. In particular, the $\rm CsK_2Sb$ photo-cathode is of interest because it has high robustness and can be driven by visible light. In this study, we performed cathode evaporation on Si(100), Si(111), and GaAs(100) substrates to evaluate the performance dependence on the substrate material and surface state. For each substrate, the cathode performance on the as-received and cleaned substrates were compared. We found that the cathode performance on the cleaned substrate was superior to that on the as-received substrate for all materials. The cathode performance on the cleaned GaAs(100) and Si(100) substrates were similar, but that on the cleaned Si(111) was significantly much lower. This result gives experimental evidence about the substrate surface direction dependence of $\rm CsK_2Sb$ photo-cathode performance. |
---|---|
Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 |
ISSN: | 2050-3911 2050-3911 |
DOI: | 10.1093/ptep/ptx030 |