Etch properties of resists modified by sequential infiltration synthesis

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Published inJournal of vacuum science and technology. B, Nanotechnology & microelectronics Vol. 29; no. 6; p. 6
Main Authors Tseng, Yu-Chih, Peng, Qing, Ocola, Leonidas E., Czaplewski, David A., Elam, Jeffrey W., Darling, Seth B.
Format Journal Article
LanguageEnglish
Published 01.11.2011
Online AccessGet full text
ISSN2166-2746
2166-2754
DOI10.1116/1.3640758

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Author Ocola, Leonidas E.
Elam, Jeffrey W.
Darling, Seth B.
Czaplewski, David A.
Tseng, Yu-Chih
Peng, Qing
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Cites_doi 10.1149/1.2335939
10.1116/1.1289547
10.1002/adma.201002465
10.1021/nn2003234
10.1116/1.585104
10.1021/jp803872s
10.1016/0038-1101(87)90035-9
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Title Etch properties of resists modified by sequential infiltration synthesis
Volume 29
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