Quantum lithography, entanglement and Heisenberg-limited parameter estimation

• Published in: Journal of optics. B, Quantum and semiclassical optics Vol. 6; no. 8; pp. S811 - S815
• Main Authors: Kok, Pieter, Braunstein, Samuel L, Dowling, Jonathan P
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Bristol IOP Publishing 01.08.2004; Institute of Physics
• Subjects: Classical and quantum physics: mechanics and fields; Exact sciences and technology; Foundations, theory of measurement, miscellaneous theories (including aharonov-bohm effect, bell inequalities, berry's phase); Fundamental areas of phenomenology (including applications); Optics; Physics; Quantum mechanics; Quantum optics; Quantum system; Parameter estimation; Quantum entanglement; Lithography; Theoretical study; Quantum optics; Quantum lithography; Quantum measure; Quantum mechanics; Quantum noise; Photoresists; Shot noise; Quantum limit; Measurement accuracy
• ISSN: 1464-4266; 1741-3575
• DOI: 10.1088/1464-4266/6/8/029

We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglement. Mathematically, the hyper-resolution of quantum lithography appears naturally in the derivation of Heisenberg-limited parameter estimation. We also review recent experiments offering a proof of the principle of quantum lithography, and we address the question of state preparation and the fabrication of suitable photoresists.