Quantum lithography, entanglement and Heisenberg-limited parameter estimation
We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglem...
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| Published in | Journal of optics. B, Quantum and semiclassical optics Vol. 6; no. 8; pp. S811 - S815 |
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| Main Authors | , , |
| Format | Journal Article Conference Proceeding |
| Language | English |
| Published |
Bristol
IOP Publishing
01.08.2004
Institute of Physics |
| Subjects | |
| Online Access | Get full text |
| ISSN | 1464-4266 1741-3575 |
| DOI | 10.1088/1464-4266/6/8/029 |
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| Abstract | We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglement. Mathematically, the hyper-resolution of quantum lithography appears naturally in the derivation of Heisenberg-limited parameter estimation. We also review recent experiments offering a proof of the principle of quantum lithography, and we address the question of state preparation and the fabrication of suitable photoresists. |
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| AbstractList | We explore the intimate relationship between quantum lithography, Heisenberg-limited parameter estimation and the rate of dynamical evolution of quantum states. We show how both the enhanced accuracy in measurements and the increased resolution in quantum lithography follow from the use of entanglement. Mathematically, the hyper-resolution of quantum lithography appears naturally in the derivation of Heisenberg-limited parameter estimation. We also review recent experiments offering a proof of the principle of quantum lithography, and we address the question of state preparation and the fabrication of suitable photoresists. |
| Author | Kok, Pieter Dowling, Jonathan P Braunstein, Samuel L |
| Author_xml | – sequence: 1 fullname: Kok, Pieter – sequence: 2 fullname: Braunstein, Samuel L – sequence: 3 fullname: Dowling, Jonathan P |
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| CitedBy_id | crossref_primary_10_1063_1_5055915 crossref_primary_10_1103_PhysRevLett_118_190502 crossref_primary_10_1364_OE_26_019583 crossref_primary_10_1103_PhysRevA_85_010101 crossref_primary_10_1103_PhysRevA_104_053704 crossref_primary_10_1103_PhysRevA_80_012318 crossref_primary_10_1103_PhysRevA_98_032114 crossref_primary_10_1038_s41598_017_00544_7 crossref_primary_10_1016_j_aop_2016_01_017 crossref_primary_10_1103_PhysRevA_104_053712 crossref_primary_10_1103_PhysRevLett_109_123601 crossref_primary_10_1002_andp_202200304 crossref_primary_10_1080_00107514_2010_509995 crossref_primary_10_1103_PhysRevA_76_063808 crossref_primary_10_1088_1464_4266_7_9_008 crossref_primary_10_1088_1612_202X_ac99e2 crossref_primary_10_1080_00107510802091298 crossref_primary_10_1140_epjp_i2018_12163_2 crossref_primary_10_1103_PhysRevLett_131_030801 crossref_primary_10_1103_PhysRevA_84_022302 crossref_primary_10_7498_aps_66_150301 crossref_primary_10_1103_PhysRevA_80_043823 crossref_primary_10_1007_s11128_018_1815_z crossref_primary_10_1103_PhysRevA_96_013853 crossref_primary_10_1103_PhysRevA_96_023858 crossref_primary_10_1038_s41598_020_69950_8 crossref_primary_10_3103_S1062873820030235 crossref_primary_10_1080_09500340_2011_585251 crossref_primary_10_1103_PhysRevA_94_013850 crossref_primary_10_1103_PhysRevResearch_3_043029 crossref_primary_10_1007_s10773_016_3232_3 crossref_primary_10_1007_s11128_018_2015_6 crossref_primary_10_1140_epjc_s10052_020_08776_0 crossref_primary_10_1063_1_4829016 crossref_primary_10_3367_UFNr_2024_01_039634 crossref_primary_10_1364_JOSAB_27_00A170 crossref_primary_10_1088_1367_2630_ab398e crossref_primary_10_1007_s11082_023_04724_w crossref_primary_10_3367_UFNe_2024_01_039634 crossref_primary_10_1098_rsta_2011_0499 crossref_primary_10_1002_qute_201900077 crossref_primary_10_1103_PhysRevLett_124_200502 crossref_primary_10_1103_PhysRevA_82_022330 crossref_primary_10_1103_PhysRevA_95_032321 crossref_primary_10_1103_PhysRevA_87_032102 crossref_primary_10_1140_epjd_e2014_50047_1 crossref_primary_10_1103_PhysRevA_73_013814 crossref_primary_10_1038_s41467_021_27922_0 crossref_primary_10_1038_s41598_017_03239_1 crossref_primary_10_1103_PhysRevA_78_053820 crossref_primary_10_1103_PhysRevA_81_022108 crossref_primary_10_1103_PhysRevA_91_022120 crossref_primary_10_1088_1464_4266_7_7_006 |
| Cites_doi | 10.1103/PhysRevA.57.4736 10.1103/PhysRevLett.87.113601 10.1103/PhysRevLett.86.4516 10.1103/PhysRevLett.89.213601 10.1103/PhysRevLett.69.2153 10.1103/PhysRevLett.77.2352 10.1103/PhysRevA.54.R4649 10.1007/s12043-002-0104-6 10.1103/PhysRevLett.62.2377 10.1103/PhysRevA.66.013804 10.1117/1.1479706 10.1119/1.17368 10.1103/PhysRevA.65.042313 10.1103/PhysRevA.63.063407 10.1103/PhysRevLett.85.2733 10.1103/PhysRevA.65.052104 10.1016/S0167-2789(98)00054-2 10.1103/PhysRevA.64.063814 10.1364/JOSAB.12.002019 10.1103/PhysRevA.65.030101 10.1103/PhysRevLett.87.013602 10.1103/PhysRevA.65.053818 10.1038/35086525 10.1103/PhysRevA.66.023819 10.1103/PhysRevLett.80.3181 |
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| Keywords | Quantum system Parameter estimation Quantum entanglement Lithography Theoretical study Quantum optics Quantum lithography Quantum measure Quantum mechanics Quantum noise Photoresists Shot noise Quantum limit Measurement accuracy |
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| References | 22 23 24 Haus H A (14) 1995; 12 Uffink J (26) 1993; 61 Mandelstam L (19) 1945; 9 Dowling J P (7) 1998; 57 10 11 12 13 Bollinger J J (2) 1996; 54 15 17 Fiurá?ek J (9) 2002; 65 18 1 3 4 5 6 8 Kok P (16) 2002; 65 Shimizu R (25) 2002; 59 20 21 |
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| Title | Quantum lithography, entanglement and Heisenberg-limited parameter estimation |
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