The effect of changing the magnetic field strength on HiPIMS deposition rates - Bradley, J W; Mishra, A; Kelly, P J (Journal of physics. D, Applied physics, 2015)
Keywords: Attraction; back attraction; Deposition; deposition rates; Field strength; flux model; Fluxes; HiPIMS; Ionization; magnetic field strengths; Magnetic fields; magnetron sputtering; Sputtering; Strength