A Coupled-Simulation-and-Optimization Approach to Nanodevice Fabrication With Minimization of Electrical Characteristics Fluctuation - Li, Yiming; Yu, Shao-Ming (IEEE transactions on semiconductor manufacturing, 2007)
Keywords: Applied sciences; Characteristics fluctuation; CMOS; CMOS technology; complementary metal-oxide-semiconductor (CMOS) fabrication; Design. Technologies. Operation analysis. Testing; device simulation; Devices; Electric variables; Electronics; Exact sciences and technology; Fabrication; Fluctuation; Fluctuations; Integrated circuits; modeling; Molecular electronics, nanoelectronics; Nanocomposites; nanodevices; Nanomaterials; Nanoscale devices; Nanostructure; Optimization; Optimization methods; Optimized production technology; Performance evaluation; process recipe; process simulation; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Semiconductors; simulation; Studies; technology computer-aided (TCAD) design; Testing; Threshold voltage; Transistors; Performance evaluation; Voltage threshold; Characteristics fluctuation; MOSFET; technology computer-aided (TCAD) design; Circuit design; simulation; device simulation; process simulation; Modeling; Optimization; Nanoelectronics; nanodevices; Complementary MOS technology; n type semiconductor; Hybrid model; process recipe; Voltage fluctuation; Computer aided design; complementary metal-oxide-semiconductor (CMOS) fabrication; Electrical characteristic