DFT modeling of carbon incorporation in GaN(0001) and GaN(000 1 ¯ ) metalorganic vapor phase epitaxy

The carbon incorporation mechanism in GaN(0001) and GaN(000 1 ¯ ) during MOVPE was investigated using density functional theory (DFT) calculations. The results confirm that the crucial factors for carbon incorporation are Fermi level pinning and accompanying surface band bending. In addition, the la...

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Published inApplied physics letters Vol. 111; no. 14
Main Authors Kempisty, Pawel, Kangawa, Yoshihiro, Kusaba, Akira, Shiraishi, Kenji, Krukowski, Stanislaw, Bockowski, Michal, Kakimoto, Koichi, Amano, Hiroshi
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 02.10.2017
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ISSN0003-6951
1077-3118
DOI10.1063/1.4991608

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Abstract The carbon incorporation mechanism in GaN(0001) and GaN(000 1 ¯ ) during MOVPE was investigated using density functional theory (DFT) calculations. The results confirm that the crucial factors for carbon incorporation are Fermi level pinning and accompanying surface band bending. In addition, the lattice symmetry has a strong dependence on the stability of carbon in a few subsurface layers, which results from interactions between the impurities and surface states. It was shown that these effects are responsible for facilitating or hindering the incorporation of impurities and dopants. The influence of diluent gas species (hydrogen or nitrogen) on carbon incorporation was discussed.
AbstractList The carbon incorporation mechanism in GaN(0001) and GaN(0001¯) during MOVPE was investigated using density functional theory (DFT) calculations. The results confirm that the crucial factors for carbon incorporation are Fermi level pinning and accompanying surface band bending. In addition, the lattice symmetry has a strong dependence on the stability of carbon in a few subsurface layers, which results from interactions between the impurities and surface states. It was shown that these effects are responsible for facilitating or hindering the incorporation of impurities and dopants. The influence of diluent gas species (hydrogen or nitrogen) on carbon incorporation was discussed.
The carbon incorporation mechanism in GaN(0001) and GaN(000 1 ¯ ) during MOVPE was investigated using density functional theory (DFT) calculations. The results confirm that the crucial factors for carbon incorporation are Fermi level pinning and accompanying surface band bending. In addition, the lattice symmetry has a strong dependence on the stability of carbon in a few subsurface layers, which results from interactions between the impurities and surface states. It was shown that these effects are responsible for facilitating or hindering the incorporation of impurities and dopants. The influence of diluent gas species (hydrogen or nitrogen) on carbon incorporation was discussed.
Author Kakimoto, Koichi
Krukowski, Stanislaw
Kempisty, Pawel
Bockowski, Michal
Kusaba, Akira
Kangawa, Yoshihiro
Amano, Hiroshi
Shiraishi, Kenji
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  organization: Center for Integrated Research of Future Electronics, Institute of Materials and Systems for Sustainability, Nagoya University
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Snippet The carbon incorporation mechanism in GaN(0001) and GaN(000 1 ¯ ) during MOVPE was investigated using density functional theory (DFT) calculations. The results...
The carbon incorporation mechanism in GaN(0001) and GaN(0001¯) during MOVPE was investigated using density functional theory (DFT) calculations. The results...
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SubjectTerms Applied physics
Carbon
Density functional theory
Dependence
Fermi surfaces
Impurities
Incorporation
Metalorganic chemical vapor deposition
Title DFT modeling of carbon incorporation in GaN(0001) and GaN(000 1 ¯ ) metalorganic vapor phase epitaxy
URI http://dx.doi.org/10.1063/1.4991608
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