NbN-based Josephson junctions grown by plasma-assisted molecular beam epitaxy - Lachowski, Artur; Wolny, Paweł; Dybko, Krzysztof; Chlipała, Mikołaj; Nowakowski-Szkudlarek, Krzesimir; Hajdel, Mateusz; Żak, Mikołaj; Feduniewicz, Anna; Sawicka, Marta; Chromiński, Witold; Grzanka, Ewa; Skierbiszewski, Czesław (Communications materials, 2025)
Keywords: 639/301/1005/1007; 639/301/119/1003; 639/766/1130/1064; Chemistry and Materials Science; Critical current density; Electrical junctions; Electrons; Epitaxial growth; Gallium nitrides; Grain size; Heterostructures; Indium; Indium gallium nitrides; Interfaces; Josephson junctions; Materials Science; Molecular beam epitaxy; Niobium nitride; Quantum computers; Quantum computing; Qubits (quantum computing); Substrates; Superlattices; Surfactants; Thin films; Transition temperature; Transmission electron microscopy