APA (7th ed.) Citation

Alsaiari, M. A., Alhemiary, N. A., Umar, A., & Hayden, B. E. (2020). Growth of amorphous, anatase and rutile phase TiO2 thin films on Pt/TiO2/SiO2/Si (SSTOP) substrate for resistive random access memory (ReRAM) device application. Ceramics international, 46(10), 16310-16320. https://doi.org/10.1016/j.ceramint.2020.03.188

Chicago Style (17th ed.) Citation

Alsaiari, Mabkhoot A., Nabil A. Alhemiary, Ahmad Umar, and Brian E. Hayden. "Growth of Amorphous, Anatase and Rutile Phase TiO2 Thin Films on Pt/TiO2/SiO2/Si (SSTOP) Substrate for Resistive Random Access Memory (ReRAM) Device Application." Ceramics International 46, no. 10 (2020): 16310-16320. https://doi.org/10.1016/j.ceramint.2020.03.188.

MLA (9th ed.) Citation

Alsaiari, Mabkhoot A., et al. "Growth of Amorphous, Anatase and Rutile Phase TiO2 Thin Films on Pt/TiO2/SiO2/Si (SSTOP) Substrate for Resistive Random Access Memory (ReRAM) Device Application." Ceramics International, vol. 46, no. 10, 2020, pp. 16310-16320, https://doi.org/10.1016/j.ceramint.2020.03.188.