APA (7th ed.) Citation

Longo, R. C., McDonnell, S., Dick, D., Wallace, R. M., Chabal, Y. J., Owen, J. H. G., . . . Cho, K. (2014). Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2×1) surface. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 32(3), . https://doi.org/10.1116/1.4864619

Chicago Style (17th ed.) Citation

Longo, Roberto C., Stephen McDonnell, D. Dick, R. M. Wallace, Yves J. Chabal, James H. G. Owen, Josh B. Ballard, John N. Randall, and Kyeongjae Cho. "Selectivity of Metal Oxide Atomic Layer Deposition on Hydrogen Terminated and Oxidized Si(001)-(2×1) Surface." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 32, no. 3 (2014). https://doi.org/10.1116/1.4864619.

MLA (9th ed.) Citation

Longo, Roberto C., et al. "Selectivity of Metal Oxide Atomic Layer Deposition on Hydrogen Terminated and Oxidized Si(001)-(2×1) Surface." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 32, no. 3, 2014, https://doi.org/10.1116/1.4864619.