Research of photolithography technology based on surface plasmon
This paper demonstrates a new process of the photolithography technology, used to fabricate simply fine patterns, by employiag surface plasmon character. The sub-wavelength periodic silica structures with uniform silver film are used as the exposure mask. According to the traditional semiconductor p...
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| Published in | Chinese physics B Vol. 19; no. 11; pp. 395 - 399 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
IOP Publishing
01.11.2010
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1674-1056 2058-3834 |
| DOI | 10.1088/1674-1056/19/11/114203 |
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| Abstract | This paper demonstrates a new process of the photolithography technology, used to fabricate simply fine patterns, by employiag surface plasmon character. The sub-wavelength periodic silica structures with uniform silver film are used as the exposure mask. According to the traditional semiconductor process, the grating structures are fabricated at exposing wavelength of 436 nm. At the same time, it provides additional and quantitative support of this technique based on the finite-difference time-domain method. The results of the research show that surface plasmon characteristics of metals can be used to increase the optical field energy distribution differences through the silica structures with silver film, which directly impact on the exposure of following photosensitive layer in different regions. |
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| AbstractList | This paper demonstrates a new process of the photolithography technology, used to fabricate simply fine patterns, by employiag surface plasmon character. The sub-wavelength periodic silica structures with uniform silver film are used as the exposure mask. According to the traditional semiconductor process, the grating structures are fabricated at exposing wavelength of 436 nm. At the same time, it provides additional and quantitative support of this technique based on the finite-difference time-domain method. The results of the research show that surface plasmon characteristics of metals can be used to increase the optical field energy distribution differences through the silica structures with silver film, which directly impact on the exposure of following photosensitive layer in different regions. |
| Author | 李海华 陈健 王庆康 |
| AuthorAffiliation | National Key Laboratory of Micro/Nano Fabrication Technology, Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, Research Institute of Miero/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China |
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| Cites_doi | 10.1038/nature01937 10.1088/1674-1056/17/1/043 10.1116/1.1823437 10.7498/aps.57.3506 10.1080/09500340701749943 10.1116/1.2091088 10.1021/nl051013j 10.1126/science.1071895 10.1364/OL.26.001972 10.1038/35570 10.1088/1478-7814/18/1/325 |
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| Notes | surface plasmons, lithography, finite-difference time-domain, sub-wavelength periodic structure TN946 TN305.7 11-5639/O4 |
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| References | Wood R W (1) 1902; 18 11 12 2 3 4 6 7 8 Zhou R L (9) 2008; 57 Cao Z Q (10) 2009 Fang L (5) 2008; 17 |
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| Snippet | This paper demonstrates a new process of the photolithography technology, used to fabricate simply fine patterns, by employiag surface plasmon character. The... |
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| SubjectTerms | 二氧化硅 光刻技术 光栅结构 半导体工艺 技术支持 有限差分时域法 等离子体特性 表面等离子体 |
| Title | Research of photolithography technology based on surface plasmon |
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