A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate

This paper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate. The device with a gate width of 0.5 mm and a gate length of 0.35μm has exhibited an extrinsic current gain cutoff frequency of 20 GHz and an extrinsic maximum frequency of oscillation of 75 GHz.U...

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Published inJournal of semiconductors Vol. 31; no. 2; pp. 5 - 6
Main Author 王东方 陈晓娟 刘新宇
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.02.2010
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ISSN1674-4926
DOI10.1088/1674-4926/31/2/024001

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Abstract This paper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate. The device with a gate width of 0.5 mm and a gate length of 0.35μm has exhibited an extrinsic current gain cutoff frequency of 20 GHz and an extrinsic maximum frequency of oscillation of 75 GHz.Under VDS=30 V,CW operating conditions at 14 GHz,the device exhibits a linear gain of 10.4 dB and a 3-dB-gain-compressed output power of 1.4 W with a power added efficiency of 41%.Under pulse operating conditions,the linear gain is 12.8 dB and the 3-dB-compressed output power is 1.7 W.The power density reaches 3.4 W/mm.
AbstractList This paper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate. The device with a gate width of 0.5 mm and a gate length of 0.35μm has exhibited an extrinsic current gain cutoff frequency of 20 GHz and an extrinsic maximum frequency of oscillation of 75 GHz.Under VDS=30 V,CW operating conditions at 14 GHz,the device exhibits a linear gain of 10.4 dB and a 3-dB-gain-compressed output power of 1.4 W with a power added efficiency of 41%.Under pulse operating conditions,the linear gain is 12.8 dB and the 3-dB-compressed output power is 1.7 W.The power density reaches 3.4 W/mm.
Author 王东方 陈晓娟 刘新宇
AuthorAffiliation Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China Graduated University of the Chinese Academy of Sciences, Beijing 100049, China
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Cites_doi 10.1109/MWSYM.2005.1516636
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AlGaN/GaN HEMT
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power
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Feng Zhen (4) 2007; 28
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Snippet This paper describes the first domestic Ku-band power AlGaN/GaN HEMT fabricated on a sapphire substrate. The device with a gate width of 0.5 mm and a gate...
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SubjectTerms AlGaN
HEMT
Ku波段
功率增益
增益压缩
最高振荡频率
蓝宝石衬底
输出功率
Title A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate
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