Device and Circuit-Level Assessment of GaSb/Si Heterojunction Vertical Tunnel-FET for Low-Power Applications

This article investigates the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket to enhance the performance of the device. The commercially available Silvaco TCAD has been used for simulating the proposed V-TFET structure. A low bandgap material, G...

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Published inIEEE transactions on electron devices Vol. 67; no. 3; pp. 1285 - 1292
Main Authors Tripathy, Manas Ranjan, Singh, Ashish Kumar, Samad, A., Chander, Sweta, Baral, Kamalaksha, Singh, Prince Kumar, Jit, Satyabrata
Format Journal Article
LanguageEnglish
Published New York IEEE 01.03.2020
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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ISSN0018-9383
1557-9646
DOI10.1109/TED.2020.2964428

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Abstract This article investigates the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket to enhance the performance of the device. The commercially available Silvaco TCAD has been used for simulating the proposed V-TFET structure. A low bandgap material, GaSb, is used in the source region for the first time to enhance the carrier tunneling through the source (GaSb)-channel (Si) heterojunction. The proposed V-TFET with a pocket shows the improved subthreshold swing (SS) of 26 mV/decade at V DS = 0.5 V over the V-TFET without any pocket. The effects of temperature on SS and I ON /I OFF ratio along with the analog/RF figures of merit (FOMs) are also analyzed for V-TFETs with and without a pocket. The results are also compared with some recently reported TFETs. The dc and analog/RF performances of V-TFET with a pocket are shown to be better than those of the V-TFET without a pocket and other reported TFET structures. Finally, the applications of V-TFETs with and without a pocket in designing inverter and ring oscillator circuits have been demonstrated. The dc and transient responses of the V-FET-based inverter and ring oscillator circuits have been analyzed using the Verilog-A model in the CADENCE tool.
AbstractList This article investigates the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket to enhance the performance of the device. The commercially available Silvaco TCAD has been used for simulating the proposed V-TFET structure. A low bandgap material, GaSb, is used in the source region for the first time to enhance the carrier tunneling through the source (GaSb)-channel (Si) heterojunction. The proposed V-TFET with a pocket shows the improved subthreshold swing (SS) of 26 mV/decade at V DS = 0.5 V over the V-TFET without any pocket. The effects of temperature on SS and I ON /I OFF ratio along with the analog/RF figures of merit (FOMs) are also analyzed for V-TFETs with and without a pocket. The results are also compared with some recently reported TFETs. The dc and analog/RF performances of V-TFET with a pocket are shown to be better than those of the V-TFET without a pocket and other reported TFET structures. Finally, the applications of V-TFETs with and without a pocket in designing inverter and ring oscillator circuits have been demonstrated. The dc and transient responses of the V-FET-based inverter and ring oscillator circuits have been analyzed using the Verilog-A model in the CADENCE tool.
This article investigates the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket to enhance the performance of the device. The commercially available Silvaco TCAD has been used for simulating the proposed V-TFET structure. A low bandgap material, GaSb, is used in the source region for the first time to enhance the carrier tunneling through the source (GaSb)-channel (Si) heterojunction. The proposed V-TFET with a pocket shows the improved subthreshold swing (SS) of 26 mV/decade at [Formula Omitted] V over the V-TFET without any pocket. The effects of temperature on SS and [Formula Omitted] ratio along with the analog/RF figures of merit (FOMs) are also analyzed for V-TFETs with and without a pocket. The results are also compared with some recently reported TFETs. The dc and analog/RF performances of V-TFET with a pocket are shown to be better than those of the V-TFET without a pocket and other reported TFET structures. Finally, the applications of V-TFETs with and without a pocket in designing inverter and ring oscillator circuits have been demonstrated. The dc and transient responses of the V-FET-based inverter and ring oscillator circuits have been analyzed using the Verilog-A model in the CADENCE tool.
Author Tripathy, Manas Ranjan
Jit, Satyabrata
Baral, Kamalaksha
Samad, A.
Singh, Prince Kumar
Chander, Sweta
Singh, Ashish Kumar
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Cites_doi 10.1109/LED.2011.2106757
10.1088/1361-648X/aac5b4
10.7567/JJAP.56.064102
10.1109/LED.2014.2362926
10.1109/LED.2009.2021079
10.1109/TED.2016.2533360
10.1016/0022-0248(95)80295-N
10.1038/s41467-019-09835-1
10.1109/TED.2016.2572610
10.1109/JETCAS.2014.2361054
10.1109/LED.2010.2044012
10.1016/j.spmi.2018.03.002
10.1109/LED.2015.2432061
10.1016/j.spmi.2019.05.037
10.5573/JSTS.2012.12.4.482
10.1109/JPROC.2010.2070470
10.1109/TED.2016.2637638
10.1109/TED.2017.2656630
10.5573/JSTS.2013.13.3.224
10.1109/LED.2010.2045631
10.1016/j.microrel.2014.02.002
10.7567/JJAPCP.5.011108
10.1109/JEDS.2015.2392793
10.1038/nature10679
10.1109/LED.2010.2047240
10.1038/srep09843
10.3390/nano8120987
10.1109/TED.2016.2566614
10.1109/LED.2007.901273
10.1016/j.sse.2008.04.003
10.1109/TED.2005.846318
10.1109/TED.2016.2555627
10.1109/JEDS.2014.2377576
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References ref35
ref13
ref34
ref12
ref37
ref15
ref36
ref14
ref30
ref33
ref11
ref32
ref10
ref2
ref1
ref17
ref16
ref19
ref18
(ref31) 2016
ref24
ref23
ref26
ref22
ref21
ref28
(ref20) 2016
ref29
mori (ref38) 2016
ref8
ref7
(ref27) 2017
ref9
ref4
krishnamohan (ref25) 2008; 67
ref3
ref6
ref5
References_xml – year: 2016
  ident: ref31
  publication-title: Cadence Virtuoso Spectre Circuit Simulator
– ident: ref15
  doi: 10.1109/LED.2011.2106757
– volume: 67
  start-page: 1
  year: 2008
  ident: ref25
  article-title: Double-gate strained-ge heterostructure tunneling FET (TFET) with record high drive currents and $\ll60$ mV/dec subthreshold slope
  publication-title: IEDM Tech Dig
– ident: ref26
  doi: 10.1088/1361-648X/aac5b4
– ident: ref12
  doi: 10.7567/JJAP.56.064102
– year: 2017
  ident: ref27
  publication-title: International Technology Roadmap for Semiconductors
– ident: ref17
  doi: 10.1109/LED.2014.2362926
– ident: ref14
  doi: 10.1109/LED.2009.2021079
– start-page: 19.4.1
  year: 2016
  ident: ref38
  article-title: Demonstrating performance improvement of complementary TFET circuits by Ion enhancement based on isoelectronic trap technology
  publication-title: IEDM Tech Dig
– ident: ref11
  doi: 10.1109/TED.2016.2533360
– ident: ref24
  doi: 10.1016/0022-0248(95)80295-N
– ident: ref23
  doi: 10.1038/s41467-019-09835-1
– ident: ref3
  doi: 10.1109/TED.2016.2572610
– ident: ref33
  doi: 10.1109/JETCAS.2014.2361054
– year: 2016
  ident: ref20
  publication-title: Atlas User Manual
– ident: ref19
  doi: 10.1109/LED.2010.2044012
– ident: ref29
  doi: 10.1016/j.spmi.2018.03.002
– ident: ref6
  doi: 10.1109/LED.2015.2432061
– ident: ref4
  doi: 10.1016/j.spmi.2019.05.037
– ident: ref13
  doi: 10.5573/JSTS.2012.12.4.482
– ident: ref1
  doi: 10.1109/JPROC.2010.2070470
– ident: ref30
  doi: 10.1109/TED.2016.2637638
– ident: ref5
  doi: 10.1109/TED.2017.2656630
– ident: ref34
  doi: 10.5573/JSTS.2013.13.3.224
– ident: ref10
  doi: 10.1109/LED.2010.2045631
– ident: ref32
  doi: 10.1016/j.microrel.2014.02.002
– ident: ref22
  doi: 10.7567/JJAPCP.5.011108
– ident: ref35
  doi: 10.1109/JEDS.2015.2392793
– ident: ref18
  doi: 10.1038/nature10679
– ident: ref28
  doi: 10.1109/LED.2010.2047240
– ident: ref9
  doi: 10.1038/srep09843
– ident: ref21
  doi: 10.3390/nano8120987
– ident: ref36
  doi: 10.1109/TED.2016.2566614
– ident: ref7
  doi: 10.1109/LED.2007.901273
– ident: ref2
  doi: 10.1016/j.sse.2008.04.003
– ident: ref8
  doi: 10.1109/TED.2005.846318
– ident: ref16
  doi: 10.1109/TED.2016.2555627
– ident: ref37
  doi: 10.1109/JEDS.2014.2377576
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Snippet This article investigates the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket to enhance the performance...
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SubjectTerms Band-to-band tunneling (BTBT)
Circuit design
Computer simulation
Field effect transistors
Gallium antimonides
heterojunction
Heterojunctions
Inverters
Logic gates
low bandgap
Performance evaluation
ring oscillator
Semiconductor devices
Silicon
subthreshold swing (SS)
Temperature
Temperature effects
TFETs
Transient response
tunnel field effect transistor (TFET)
Tunneling
Title Device and Circuit-Level Assessment of GaSb/Si Heterojunction Vertical Tunnel-FET for Low-Power Applications
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