Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma
Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma (ICP) to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing. This study utilized a two-dimensional self-consistent fluid model t...
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Published in | Plasma science & technology Vol. 26; no. 7; pp. 75402 - 75410 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Plasma Science and Technology
01.07.2024
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Subjects | |
Online Access | Get full text |
ISSN | 1009-0630 |
DOI | 10.1088/2058-6272/ad31ef |
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Abstract | Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma (ICP) to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing. This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP. The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density. Furthermore, optimizing the coil within the ICP reactor, using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity, elevating it from 56% to 96% within the range of the model sizes. Additionally, when the chamber aspect ratio k changes from 2.8 to 4.7, the plasma distribution changes from a center-high to a saddle-shaped distribution. Moreover, the plasma uniformity becomes worse. Finally, adjusting process parameters, such as increasing source power and gas pressure, can enhance plasma uniformity. These findings contribute to optimizing the etching process by improving plasma radial uniformity. |
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AbstractList | Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma (ICP) to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing. This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP. The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density. Furthermore, optimizing the coil within the ICP reactor, using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity, elevating it from 56% to 96% within the range of the model sizes. Additionally, when the chamber aspect ratio k changes from 2.8 to 4.7, the plasma distribution changes from a center-high to a saddle-shaped distribution. Moreover, the plasma uniformity becomes worse. Finally, adjusting process parameters, such as increasing source power and gas pressure, can enhance plasma uniformity. These findings contribute to optimizing the etching process by improving plasma radial uniformity. |
Author | SONG, Shasha ZHAO, Yang GAO, Shengrong ZHOU, Xiaohua ZHAO, Yuzhen |
Author_xml | – sequence: 1 givenname: Yang surname: ZHAO fullname: ZHAO, Yang organization: Shaanxi International Joint Research Center for Applied Technology of Controllable Neutron Source, Xijing University, Xi’an 710123, People’s Republic of China – sequence: 2 givenname: Xiaohua surname: ZHOU fullname: ZHOU, Xiaohua organization: Shaanxi International Joint Research Center for Applied Technology of Controllable Neutron Source, Xijing University, Xi’an 710123, People’s Republic of China – sequence: 3 givenname: Shengrong surname: GAO fullname: GAO, Shengrong organization: Shaanxi International Joint Research Center for Applied Technology of Controllable Neutron Source, Xijing University, Xi’an 710123, People’s Republic of China – sequence: 4 givenname: Shasha surname: SONG fullname: SONG, Shasha organization: Shaanxi International Joint Research Center for Applied Technology of Controllable Neutron Source, Xijing University, Xi’an 710123, People’s Republic of China – sequence: 5 givenname: Yuzhen surname: ZHAO fullname: ZHAO, Yuzhen organization: Technological Institute of Materials & Energy Science (TIMES), Xi’an Key Laboratory of Advanced Photo-electronics Materials and Energy Conversion Device, School of Electronic Information, Xijing University, Xi’an 710123, People’s Republic of China |
BookMark | eNp9kDtPwzAUhT0UiRbYGb2xEGrHduKMqCoPqRILzJbjh3CV2MF2kPrvSWgnBExXOrrfkc63AgsfvAHgGqM7jDhfl4jxoirrci01wcYuwBIj1BSoIugcrFLaI8Row8kS-K21RmUYLFTBdVB6DdW77FsTYcpxVHmMBgYPh06mXsIotZMdHL2zIfYuH6Dz32GANpqP0Xg1R3oC3afpDlPrOHRGn_hLcGZll8zV6V6At4ft6-ap2L08Pm_ud4UijOZC0dZwQmtOEGUMcy1lo1vMOKeaEka0LNtW19o0umG8ZtMcSwzRHCnbzsMuQHXsVTGkFI0VymWZXfA5StcJjMRsSsymxGxKHE1NIPoBDtH1Mh7-Q26OiAuD2Icx-mmZGFIWZSVqgWpGUSkGPX_e_vL5Z_EXksqN6Q |
CitedBy_id | crossref_primary_10_1063_5_0214357 crossref_primary_10_1088_1361_6595_adb788 |
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ContentType | Journal Article |
Copyright | 2024, Hefei Institutes of Physical Science, Chinese Academy of Sciences and IOP Publishing. All rights reserved |
Copyright_xml | – notice: 2024, Hefei Institutes of Physical Science, Chinese Academy of Sciences and IOP Publishing. All rights reserved |
DBID | AAYXX CITATION |
DOI | 10.1088/2058-6272/ad31ef |
DatabaseName | CrossRef |
DatabaseTitle | CrossRef |
DatabaseTitleList | CrossRef |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Physics |
ExternalDocumentID | 10_1088_2058_6272_ad31ef pstad31ef |
GroupedDBID | -SA -S~ 123 1JI 4.4 5B3 5VR 5VS 5ZH 7.M 7.Q AAGCD AAJIO AAJKP AATNI AAXDM ABHWH ABQJV ACAFW ACGFS ACHIP AEFHF AENEX AFYNE AKPSB ALMA_UNASSIGNED_HOLDINGS AOAED CAJEA CCEZO CCVFK CEBXE CHBEP CJUJL CRLBU CS3 CW9 DU5 EBS EDWGO EMSAF EPQRW EQZZN FA0 HAK IJHAN IOP IZVLO KOT LAP N5L N9A P2P PJBAE R4D RIN RNS RO9 ROL RPA SY9 U1G U5K W28 AAYXX ADEQX AEINN CITATION Q-- |
ID | FETCH-LOGICAL-c354t-c4be834783045518daa9db15884d4353da2bbd7de9d95875005f3e3d80cfb4983 |
IEDL.DBID | IOP |
ISSN | 1009-0630 |
IngestDate | Wed Oct 01 04:23:08 EDT 2025 Thu Apr 24 23:07:59 EDT 2025 Wed Sep 25 08:11:24 EDT 2024 Tue Aug 20 22:17:06 EDT 2024 |
IsDoiOpenAccess | false |
IsOpenAccess | true |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 7 |
Language | English |
License | This article is available under the terms of the IOP-Standard License. |
LinkModel | DirectLink |
MergedId | FETCHMERGED-LOGICAL-c354t-c4be834783045518daa9db15884d4353da2bbd7de9d95875005f3e3d80cfb4983 |
OpenAccessLink | https://doi.org/10.1088/2058-6272/ad31ef |
PageCount | 9 |
ParticipantIDs | crossref_citationtrail_10_1088_2058_6272_ad31ef crossref_primary_10_1088_2058_6272_ad31ef iop_journals_10_1088_2058_6272_ad31ef |
ProviderPackageCode | CITATION AAYXX |
PublicationCentury | 2000 |
PublicationDate | 20240701 2024-07-01 |
PublicationDateYYYYMMDD | 2024-07-01 |
PublicationDate_xml | – month: 7 year: 2024 text: 20240701 day: 01 |
PublicationDecade | 2020 |
PublicationTitle | Plasma science & technology |
PublicationTitleAlternate | Plasma Sci. Technol |
PublicationYear | 2024 |
Publisher | Plasma Science and Technology |
Publisher_xml | – name: Plasma Science and Technology |
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SSID | ssj0054983 |
Score | 2.338707 |
Snippet | Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma (ICP) to meet the demand for... |
SourceID | crossref iop |
SourceType | Enrichment Source Index Database Publisher |
StartPage | 75402 |
SubjectTerms | chamber aspect ratio fluid simulation inductively coupled plasma optimized coil plasma uniformity |
Title | Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma |
URI | https://iopscience.iop.org/article/10.1088/2058-6272/ad31ef |
Volume | 26 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
journalDatabaseRights | – providerCode: PRVIOP databaseName: IOP Science Platform issn: 1009-0630 databaseCode: IOP dateStart: 19990101 customDbUrl: isFulltext: true dateEnd: 99991231 titleUrlDefault: https://iopscience.iop.org/ omitProxy: false ssIdentifier: ssj0054983 providerName: IOP Publishing |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1LSwMxEA5VEbz4Ft_koAcP23aTfWTxJKIUwcdBwYMQ8sTidndpuwf99U6arViRIt5CSLJhZjP5Jpn5gtAJIzqNhbQBVZIEUczCAGyegnUVGxuFmdHCHQ3c3iW9p-jmOX5uofOvXJiyakx_G4qeKNiLsAmIY-CuxyxISEo6QtPQ2AW0RBn4FS577_5haobB72E-ut6d_ie029xR_jbCzJ60AN_9tsVcr6GX6eR8ZMlbux7Ltvr4wdv4z9mvo9UGeuIL33QDtUyxiZYnIaBqtIUKT2SMS4tV2c-xKDRWr8I9GII9y2w9NLgscAWAeyDw0LEa5LguXG7XAMA87heTyhLboQ_QdlWOTxYsav4Oo9ZVbnTTfxs9XV89XvaC5jWGQNE4GgcqkobRKGXubjUOmRYi0zJ0ia4aMBfVgkipU20yncXgBYEKLDVUs66y0iljBy0WZWF2EdaaSEO6SikaAiAkEnxAS2WYpFCSxO6hzlQfXDVU5e7FjJxPrswZ406K3EmReynuobOvHpWn6ZjT9hSUw5u1OprTDs-0q0ZjThKeckBZ4HXzStv9Pw51gFYIgCEf5nuIFkFp5gjAzFgeT37aT1C07i8 |
linkProvider | IOP Publishing |
linkToPdf | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV1Lb9QwELb6EIgLtDxEoS0-wIFDdjd2nDhH1Ha1LW3pgZV6M36qK7JJtLs5wK9nHHsriqoKqTfLsp1kJp58kxl_g9BHTkzBpHIJ1YokGeNpAjZPw75i1mVpaY30vwYuLvPJNDu7Ztexzml_FqZpo-kfQDMQBQcRxoQ4Du4640lOCjKUhqbWDVvjNtE2o6zwtRtOv12tTTH4Pjxk2PsIQE5HMU553yp3vkubcO2_PjPjF-jH-gZDdsnPQbdSA_37H-7GRzzBDnoeISj-Eobvog1bv0RP-lRQvXyF6kBojBuHdTOrsKwN1jfSFw7BgW22W1jc1LgF4D2XeOHZDSrc1f6M1xxAPZ7VfWeD3SIkavsuzysLlrX6Bat2bWVNnP8aTccn348mSazKkGjKslWiM2U5zQruY6ws5UbK0qjUH3g1gL2okUQpUxhbmpKBNwRqcNRSw0faKa-QN2irbmr7FmFjiLJkpLWmKQBDosAXdFSleQEtRdweGq51InSkLPeVMyrRh845F16SwktSBEnuoc-3M9pA1_HA2E-gIBH37PKBcfjOuHa5EiQXhQC0Bd63AOW9-8-lPqCnV8djcX56-fU9ekYAH4XM3320BfqzB4BvVuqwf4f_AGmh85k |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Effect+of+coil+and+chamber+structure+on+plasma+radial+uniformity+in+radio+frequency+inductively+coupled+plasma&rft.jtitle=Plasma+science+%26+technology&rft.au=ZHAO+%E8%B5%B5%2C+Yang+%E6%B4%8B&rft.au=ZHOU+%E5%91%A8%2C+Xiaohua+%E6%99%93%E5%8D%8E&rft.au=GAO+%E9%AB%98%2C+Shengrong+%E5%8D%87%E8%8D%A3&rft.au=SONG+%E5%AE%8B%2C+Shasha+%E8%8E%8E%E8%8E%8E&rft.date=2024-07-01&rft.issn=1009-0630&rft.volume=26&rft.issue=7&rft.spage=75402&rft_id=info:doi/10.1088%2F2058-6272%2Fad31ef&rft.externalDBID=n%2Fa&rft.externalDocID=10_1088_2058_6272_ad31ef |
thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1009-0630&client=summon |
thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1009-0630&client=summon |
thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1009-0630&client=summon |