Scharer, J., Eldridge, O., Chang, S., Zhang, Y., Bettenhausen, M., & Lam, N. (1993). Electron cyclotron wave propagation, absorption, and backscatter measurements in a laboratory plasma. IEEE transactions on plasma science, 21(3), 271-281. https://doi.org/10.1109/27.277552
Chicago Style (17th ed.) CitationScharer, J.E, O.C Eldridge, S.-F.R Chang, Y.-S Zhang, M.H Bettenhausen, and N.T Lam. "Electron Cyclotron Wave Propagation, Absorption, and Backscatter Measurements in a Laboratory Plasma." IEEE Transactions on Plasma Science 21, no. 3 (1993): 271-281. https://doi.org/10.1109/27.277552.
MLA (9th ed.) CitationScharer, J.E, et al. "Electron Cyclotron Wave Propagation, Absorption, and Backscatter Measurements in a Laboratory Plasma." IEEE Transactions on Plasma Science, vol. 21, no. 3, 1993, pp. 271-281, https://doi.org/10.1109/27.277552.