Enhanced ferromagnetism by preventing antiferromagnetic MnO2 in InP:Be/Mn/InP:Be triple layers fabricated using molecular beam epitaxy

The p-type InP:Be/Mn/InMnP:Be triple epilayers were prepared using MBE to increase Tc (>300 K) by preventing MnO2. After milling 1–3 nm of epilayers thickness from the top surface, the transmission electron microscopy (TEM) and X-ray diffraction (XRD) revealed no MnO2 and precipitates, and TEM an...

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Published inCurrent applied physics Vol. 14; no. 4; pp. 558 - 562
Main Authors Lee, D.J., Park, C.S., Lee, Cheol Jin, Song, J.D., Koo, H.C., Yoon, Chong S., Yoon, Im Taek, Kim, H.S., Kang, T.W., Shon, Yoon
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.04.2014
한국물리학회
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ISSN1567-1739
1878-1675
DOI10.1016/j.cap.2014.01.017

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Summary:The p-type InP:Be/Mn/InMnP:Be triple epilayers were prepared using MBE to increase Tc (>300 K) by preventing MnO2. After milling 1–3 nm of epilayers thickness from the top surface, the transmission electron microscopy (TEM) and X-ray diffraction (XRD) revealed no MnO2 and precipitates, and TEM and XRD results coincide with results of ferromagnetism. The enhanced ferromagnetic transition at >300 K corresponds to InMnP:Be. The increased ferromagnetic coupling without MnO2 is considered to originate from the increased p–d hybridation. These results demonstrate that InP-based ferromagnetic semiconductor layers having enhanced ferromagnetism can be formed by above process. •We report characteristics for the p-type InP:Be/Mn/InMnP:Be triple epilayers which persists above Tc: 300 K.•InMnP:Be epilayers annealed at 250 °C for 30 min with the Mn concentration of 1%.•The double cross-check of transmission electron microscopy and X-ray diffraction did not MnO2 and any precipitates.•Enhanced Tc is caused by the prevention of antiferromagnetic MnO2 above.•Mechanism of ferromagnetic semiconductor is originated from intrinsic InMnP:Be mediated by hole.
Bibliography:G704-001115.2014.14.4.015
ISSN:1567-1739
1878-1675
DOI:10.1016/j.cap.2014.01.017