Electrical properties of silver Schottky contacts to ZnO thin films

ZnO thin films are deposited on Al/Si substrates by the pulsed laser deposition (PLD) method. The XRD and SEM images of films are examined. Highly c-axis oriented ZnO thin films which have uniform compact surface morphology are fabricated. The size of surface grains is about 30 nm. The Schottky barr...

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Published inOptoelectronics letters Vol. 5; no. 3; pp. 216 - 219
Main Author 李新坤 李清山 梁德春 徐言东
Format Journal Article
LanguageEnglish
Published Heidelberg Tianjin University of Technology 01.05.2009
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ISSN1673-1905
1993-5013
DOI10.1007/s11801-009-8216-6

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Abstract ZnO thin films are deposited on Al/Si substrates by the pulsed laser deposition (PLD) method. The XRD and SEM images of films are examined. Highly c-axis oriented ZnO thin films which have uniform compact surface morphology are fabricated. The size of surface grains is about 30 nm. The Schottky barrier ultraviolet detectors with silver Schottky contacts are made on ZnO thin films. The current-voltage characteristics are measured. The ideality contact factor between Ag and ZnO film is 1.22, while the barrier height is 0.908 e V. After annealing at 600 ℃ for 2h, the ideality factor is 1.18 and the barrier height is 0.988 eV. With the illumination of 325 nm wavelength UV-light, the photocurrent-to-dark current ratios before and after annealing are 140.4 and 138.4 biased at 5 V, respectively. The photocurrents increase more than two orders of magnitude over the dark currents.
AbstractList ZnO thin films are deposited on Al/Si substrates by the pulsed laser deposition (PLD) method. The XRD and SEM images of films are examined. Highly c-axis oriented ZnO thin films which have uniform compact surface morphology are fabricated. The size of surface grains is about 30 nm. The Schottky barrier ultraviolet detectors with silver Schottky contacts are made on ZnO thin films. The current-voltage characteristics are measured. The ideality contact factor between Ag and ZnO film is 1.22, while the barrier height is 0.908 e V. After annealing at 600 ℃ for 2h, the ideality factor is 1.18 and the barrier height is 0.988 eV. With the illumination of 325 nm wavelength UV-light, the photocurrent-to-dark current ratios before and after annealing are 140.4 and 138.4 biased at 5 V, respectively. The photocurrents increase more than two orders of magnitude over the dark currents.
ZnO thin films are deposited on Al/Si substrates by the pulsed laser deposition (PLD) method. The XRD and SEM images of films are examined. Highly c-axis oriented ZnO thin films which have uniform compact surface morphology are fabricated. The size of surface grains is about 30 nm. The Schottky barrier ultraviolet detectors with silver Schottky contacts are made on ZnO thin films. The current-voltage characteristics are measured. The ideality contact factor between Ag and ZnO film is 1.22, while the barrier height is 0.908 e V. After annealing at 600 °C for 2h, the ideality factor is 1.18 and the barrier height is 0.988 eV. With the illumination of 325 nm wavelength UV-light, the photocurrent-to-dark current ratios before and after annealing are 140.4 and 138.4 biased at 5 V, respectively. The photocurrents increase more than two orders of magnitude over the dark currents.
Author 李新坤 李清山 梁德春 徐言东
AuthorAffiliation College of Physics and Engineering, Qufu Normal University, Quilt 273165, China Ludong University, Yantai 264025, China Institute of Semiconductors, Chinese Academty of Science, Beijing 100083, China
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Keywords Barrier Height
Pulse Laser Deposition
Schottky Contact
Ideality Factor
Dark Current
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Snippet ZnO thin films are deposited on Al/Si substrates by the pulsed laser deposition (PLD) method. The XRD and SEM images of films are examined. Highly c-axis...
ZnO thin films are deposited on Al/Si substrates by the pulsed laser deposition (PLD) method. The XRD and SEM images of films are examined. Highly c-axis...
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StartPage 216
SubjectTerms Lasers
Optical Devices
Optics
Photonics
Physics
Physics and Astronomy
PLD器件
ZnO薄膜
电学性能
电流电压特性
紫外探测器
肖特基接触
脉冲激光沉积

Title Electrical properties of silver Schottky contacts to ZnO thin films
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