An air-stable inverted photovoltaic device using ZnO as the electron selective layer and MoO3 as the blocking layer
An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (PCBM)/MoO3/Ag is studied. We fm.d that the optimum thickness of the MoO3 layer is 2 nm. When th...
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Published in | Optoelectronics letters Vol. 7; no. 5; pp. 330 - 333 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
Heidelberg
Tianjin University of Technology
01.09.2011
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Subjects | |
Online Access | Get full text |
ISSN | 1673-1905 1993-5013 |
DOI | 10.1007/s11801-011-1061-4 |
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Summary: | An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (PCBM)/MoO3/Ag is studied. We fm.d that the optimum thickness of the MoO3 layer is 2 nm. When the MoO3 blocking layer is introduced, the fill factor of the devices is increased from 29% to 40%, the power conversion efficiency is directly promoted from 0.35% to 1.27%.The stability under ambient conditions of this inverted structure device much is better due to the improved stability at the polymer/Ag interface. The enhancement is attributed to the high carriers mobility and suitable band gap of MoO3 layer. |
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Bibliography: | 12-1370/TN SONG Peng-fei, QIN Wen-jing , DING Guo-jing , YAN Qi-qi , YANG Li-ying, YIN Shou-gen (1. Key Laboratory of Display Materials and Photoelectric Devices, Education Ministry of China, School of Materials Science and Engineering, Tianjin University of Technology, Tianjin 300384, China; 2. Tianjin Key Lab. for Photoelectric Materials and Devices, Tianjin University of Technology, Tianjin 300384, China) An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (PCBM)/MoO3/Ag is studied. We fm.d that the optimum thickness of the MoO3 layer is 2 nm. When the MoO3 blocking layer is introduced, the fill factor of the devices is increased from 29% to 40%, the power conversion efficiency is directly promoted from 0.35% to 1.27%.The stability under ambient conditions of this inverted structure device much is better due to the improved stability at the polymer/Ag interface. The enhancement is attributed to the high carriers mobility and suitable band gap of MoO3 layer. |
ISSN: | 1673-1905 1993-5013 |
DOI: | 10.1007/s11801-011-1061-4 |