An air-stable inverted photovoltaic device using ZnO as the electron selective layer and MoO3 as the blocking layer

An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (PCBM)/MoO3/Ag is studied. We fm.d that the optimum thickness of the MoO3 layer is 2 nm. When th...

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Published inOptoelectronics letters Vol. 7; no. 5; pp. 330 - 333
Main Author 宋朋飞 秦文静 丁国静 闫齐齐 杨利营 印寿根
Format Journal Article
LanguageEnglish
Published Heidelberg Tianjin University of Technology 01.09.2011
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ISSN1673-1905
1993-5013
DOI10.1007/s11801-011-1061-4

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Summary:An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (PCBM)/MoO3/Ag is studied. We fm.d that the optimum thickness of the MoO3 layer is 2 nm. When the MoO3 blocking layer is introduced, the fill factor of the devices is increased from 29% to 40%, the power conversion efficiency is directly promoted from 0.35% to 1.27%.The stability under ambient conditions of this inverted structure device much is better due to the improved stability at the polymer/Ag interface. The enhancement is attributed to the high carriers mobility and suitable band gap of MoO3 layer.
Bibliography:12-1370/TN
SONG Peng-fei, QIN Wen-jing , DING Guo-jing , YAN Qi-qi , YANG Li-ying, YIN Shou-gen (1. Key Laboratory of Display Materials and Photoelectric Devices, Education Ministry of China, School of Materials Science and Engineering, Tianjin University of Technology, Tianjin 300384, China; 2. Tianjin Key Lab. for Photoelectric Materials and Devices, Tianjin University of Technology, Tianjin 300384, China)
An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (PCBM)/MoO3/Ag is studied. We fm.d that the optimum thickness of the MoO3 layer is 2 nm. When the MoO3 blocking layer is introduced, the fill factor of the devices is increased from 29% to 40%, the power conversion efficiency is directly promoted from 0.35% to 1.27%.The stability under ambient conditions of this inverted structure device much is better due to the improved stability at the polymer/Ag interface. The enhancement is attributed to the high carriers mobility and suitable band gap of MoO3 layer.
ISSN:1673-1905
1993-5013
DOI:10.1007/s11801-011-1061-4