Room-temperature direct-bandgap photoluminescence from strain-compensated Ge/SiGe multiple quantum wells on silicon

Strain-compensated Ge/Si0.15Ge0.85 multiple quantum wells were grown on an Si0.1 Ge0.9 virtual substrate using ultrahigh vacuum chemical vapor deposition technology on an n+-Si(001) substrate. Photoluminescence measurements were performed at room temperature, and the quantum confinement effect of th...

Full description

Saved in:
Bibliographic Details
Published inChinese physics B Vol. 21; no. 1; pp. 493 - 498
Main Author 胡炜玄 成步文 薛春来 张广泽 苏少坚 左玉华 王启明
Format Journal Article
LanguageEnglish
Published 2012
Subjects
Online AccessGet full text
ISSN1674-1056
2058-3834
1741-4199
DOI10.1088/1674-1056/21/1/017805

Cover

More Information
Summary:Strain-compensated Ge/Si0.15Ge0.85 multiple quantum wells were grown on an Si0.1 Ge0.9 virtual substrate using ultrahigh vacuum chemical vapor deposition technology on an n+-Si(001) substrate. Photoluminescence measurements were performed at room temperature, and the quantum confinement effect of the direct-bandgap transitions of a Ge quantum well was observed, which is in good agreement with the calculated results. The luminescence mechanism was discussed by recombination rate analysis and the temperature dependence of the luminescence spectrum.
Bibliography:Ge, multiple quantum wells, strain compensated
11-5639/O4
Strain-compensated Ge/Si0.15Ge0.85 multiple quantum wells were grown on an Si0.1 Ge0.9 virtual substrate using ultrahigh vacuum chemical vapor deposition technology on an n+-Si(001) substrate. Photoluminescence measurements were performed at room temperature, and the quantum confinement effect of the direct-bandgap transitions of a Ge quantum well was observed, which is in good agreement with the calculated results. The luminescence mechanism was discussed by recombination rate analysis and the temperature dependence of the luminescence spectrum.
Hu Wei-Xuan, Cheng Bu-Wen, Xue Chun-Lai, Zhang Guang-Ze Su Shao-Jian, Zuo Yu-Hua, and Wang Qi-Ming( State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences Beijing 100083, China)
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1674-1056
2058-3834
1741-4199
DOI:10.1088/1674-1056/21/1/017805