APA (7th ed.) Citation

Benner, F., Jordan, P. M., Richter, C., Simon, D. K., Dirnstorfer, I., Knaut, M., . . . Mikolajick, T. (2014). Atomic layer deposited high-κ nanolaminates for silicon surface passivation. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 32(3), . https://doi.org/10.1116/1.4863499

Chicago Style (17th ed.) Citation

Benner, Frank, Paul M. Jordan, Claudia Richter, Daniel K. Simon, Ingo Dirnstorfer, Martin Knaut, Johann W. Bartha, and Thomas Mikolajick. "Atomic Layer Deposited High-κ Nanolaminates for Silicon Surface Passivation." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 32, no. 3 (2014). https://doi.org/10.1116/1.4863499.

MLA (9th ed.) Citation

Benner, Frank, et al. "Atomic Layer Deposited High-κ Nanolaminates for Silicon Surface Passivation." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 32, no. 3, 2014, https://doi.org/10.1116/1.4863499.