APA (7th ed.) Citation

Chen, Y., Yuan, T., Bae, S. J., & Kuo, Y. (2021). Two-level differential burn-in policy for spatially heterogeneous defect units in semiconductor manufacturing. Computers & industrial engineering, 162, 107768. https://doi.org/10.1016/j.cie.2021.107768

Chicago Style (17th ed.) Citation

Chen, Yuan, Tao Yuan, Suk Joo Bae, and Yue Kuo. "Two-level Differential Burn-in Policy for Spatially Heterogeneous Defect Units in Semiconductor Manufacturing." Computers & Industrial Engineering 162 (2021): 107768. https://doi.org/10.1016/j.cie.2021.107768.

MLA (9th ed.) Citation

Chen, Yuan, et al. "Two-level Differential Burn-in Policy for Spatially Heterogeneous Defect Units in Semiconductor Manufacturing." Computers & Industrial Engineering, vol. 162, 2021, p. 107768, https://doi.org/10.1016/j.cie.2021.107768.