CMP Process Optimization Engineering by Machine Learning - Yu, Hsiang-Meng; Lin, Chih-Chen; Hsu, Min-Hsuan; Chen, Yen-Ting; Chen, Kuang-Wei; Luoh, Tuung; Yang, Ling-Wuu; Yang, Tahone; Chen, Kuang-Chao (IEEE transactions on semiconductor manufacturing, 2021)
Keywords: Algorithms; artificial intelligence; Artificial neural networks; Chemical-mechanical polishing; closed loop systems; Disks; Layout; Layouts; Machine learning; Neural networks; Optimization; Prediction algorithms; Predictive models; Process control; Semiconductor device modeling; Semiconductor process modeling; Slurries; Test vehicles; thickness control; Topology; Wafers