APA (7th ed.) Citation

Yu, H., Lin, C., Hsu, M., Chen, Y., Chen, K., Luoh, T., . . . Chen, K. (2021). CMP Process Optimization Engineering by Machine Learning. IEEE transactions on semiconductor manufacturing, 34(3), 280-285. https://doi.org/10.1109/TSM.2021.3072361

Chicago Style (17th ed.) Citation

Yu, Hsiang-Meng, Chih-Chen Lin, Min-Hsuan Hsu, Yen-Ting Chen, Kuang-Wei Chen, Tuung Luoh, Ling-Wuu Yang, Tahone Yang, and Kuang-Chao Chen. "CMP Process Optimization Engineering by Machine Learning." IEEE Transactions on Semiconductor Manufacturing 34, no. 3 (2021): 280-285. https://doi.org/10.1109/TSM.2021.3072361.

MLA (9th ed.) Citation

Yu, Hsiang-Meng, et al. "CMP Process Optimization Engineering by Machine Learning." IEEE Transactions on Semiconductor Manufacturing, vol. 34, no. 3, 2021, pp. 280-285, https://doi.org/10.1109/TSM.2021.3072361.