Effects of thickness and annealing condition on magnetic properties and thermal stabilities of Ta/Nd/NdFeB/Nd/Ta sandwiched films

Ta/Nd/NdFeB/Nd/Ta sandwiched films are deposited by magnetron sputtering on Si（100） substrates,and subsequently annealed in vacuum at different temperatures for different time.It is found that both the thickness of NdFeB and Nd layer and the annealing condition can affect the magnetic properties of...

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Published inChinese physics B Vol. 25; no. 11; pp. 526 - 529
Main Author 刘文峰 张敏刚 张克维 张海杰 许小红 柴跃生
Format Journal Article
LanguageEnglish
Published 01.11.2016
Online AccessGet full text
ISSN1674-1056
2058-3834
DOI10.1088/1674-1056/25/11/117506

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Abstract Ta/Nd/NdFeB/Nd/Ta sandwiched films are deposited by magnetron sputtering on Si（100） substrates,and subsequently annealed in vacuum at different temperatures for different time.It is found that both the thickness of NdFeB and Nd layer and the annealing condition can affect the magnetic properties of Ta/Nd/NdFeB/Nd/Ta films.Interestingly,the thickness and annealing temperature show the relevant behaviors that can affect the magnetic properties of the film.The high coercivity of 24.1 kOe（1 Oe = 79.5775 A/m） and remanence ratio（remanent magnetization/saturation magnetization）of 0.94 can be obtained in a Ta/Nd（250 nm）/NdFeB（600 nm）/Nd（250 nm）/Ta film annealed for 3 min at 1023 K.In addition,the thermal stability of the film is also linked to the thickness of NdFeB and Nd layer and the annealing temperature as well.The excellent thermal stability can be achieved in a Ta/Nd（250 nm）/NdFeB（600 nm）/Nd（250 nm）/Ta film annealed at1023 K.
AbstractList Ta/Nd/NdFeB/Nd/Ta sandwiched films are deposited by magnetron sputtering on Si（100） substrates,and subsequently annealed in vacuum at different temperatures for different time.It is found that both the thickness of NdFeB and Nd layer and the annealing condition can affect the magnetic properties of Ta/Nd/NdFeB/Nd/Ta films.Interestingly,the thickness and annealing temperature show the relevant behaviors that can affect the magnetic properties of the film.The high coercivity of 24.1 kOe（1 Oe = 79.5775 A/m） and remanence ratio（remanent magnetization/saturation magnetization）of 0.94 can be obtained in a Ta/Nd（250 nm）/NdFeB（600 nm）/Nd（250 nm）/Ta film annealed for 3 min at 1023 K.In addition,the thermal stability of the film is also linked to the thickness of NdFeB and Nd layer and the annealing temperature as well.The excellent thermal stability can be achieved in a Ta/Nd（250 nm）/NdFeB（600 nm）/Nd（250 nm）/Ta film annealed at1023 K.
Author 刘文峰 张敏刚 张克维 张海杰 许小红 柴跃生
AuthorAffiliation School of Materials Science and Engineering, Institute of Advanced Materials, Taiyuan University of Science and Technology, Taiyuan 030024, China Institute of Materials Chemistry, Shanxi Normal University, Linfen 041000, China
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Notes annealing NdFeB annealed coercivity magnetization magnetron sputtering vacuum subsequently magnetometer
11-5639/O4
Ta/Nd/NdFeB/Nd/Ta sandwiched films are deposited by magnetron sputtering on Si（100） substrates,and subsequently annealed in vacuum at different temperatures for different time.It is found that both the thickness of NdFeB and Nd layer and the annealing condition can affect the magnetic properties of Ta/Nd/NdFeB/Nd/Ta films.Interestingly,the thickness and annealing temperature show the relevant behaviors that can affect the magnetic properties of the film.The high coercivity of 24.1 kOe（1 Oe = 79.5775 A/m） and remanence ratio（remanent magnetization/saturation magnetization）of 0.94 can be obtained in a Ta/Nd（250 nm）/NdFeB（600 nm）/Nd（250 nm）/Ta film annealed for 3 min at 1023 K.In addition,the thermal stability of the film is also linked to the thickness of NdFeB and Nd layer and the annealing temperature as well.The excellent thermal stability can be achieved in a Ta/Nd（250 nm）/NdFeB（600 nm）/Nd（250 nm）/Ta film annealed at1023 K.
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