Measurement of the hydroxyl radical formation from H2O2, NO3−, and Fe(III) using a continuous flow injection analysis

• Published in: Journal of industrial and engineering chemistry (Seoul, Korea) Vol. 16; no. 2; pp. 193 - 199
• Main Authors: Kwon, Bum Gun, Kwon, Jung-Hwan
• Format: Journal Article
• Language: English
• Published: 한국공업화학회 25.03.2010
• Subjects: 화학공학
• ISSN: 1226-086X; 1876-794X
• DOI: 10.1016/j.jiec.2009.10.007

Production of hydroxyl radical (OH) is of significant concern in engineered and natural environment. A simple in situ method was developed to measure OH formation in UV/H2O2, UV/Fe(III), and UV/NO3 systems using trapping of OH by benzoic acid (BA) and measuring fluorescence signals from hydroxylated products of BA. Method development included characterization of OH trapping mechanism and measurement of quantum yields (FOH) for OH. The distribution of OHBA isomers was in the order of o-OHBA > p-OHBA > m-OHBA, although it changed with the H2O2 concentration and light intensity. This supports that OH attacks dominantly on the benzene rings. The quantum yields for OH formation in the UV/H2O2 process were 1.02 and 0.59 at 254 and 313 nm, which were in good agreement with the literature values, confirming that themethod is suitable for the measurement of OH production from UV/H2O2 processes. Using the continuous flow method developed, quantum yields for OH in UV/H2O2, UV/Fe(III), and UV/NO3 systems were measured varying the initial concentration of OH precursors. TheFOH values increased with increasing concentrations of H2O2, Fe(III), and NO3 and approached constant values as the concentration increased. The FOH values were 0.009 for H2O2 at 365 nm, showing that OH production is not negligible at such high wavelength. TheFOH values during the photolysis of Fe(OH)2+ (pH 3.0) and Fe(OH)2 + (pH 6.0) at 254 nm were 0.34 and 0.037, respectively. TheFOH values for NO3 approached a constant value of 0.045 at 254 nm at the initial concentration of 10 mM. KCI Citation Count: 14