Two-dimensional simulation of polysilicon etching with chlorine in a high density plasma reactor - Lymberopoulos, D.P.; Economou, D.J. (IEEE transactions on plasma science, 1995)
Keywords: Chemical reactions; Chemicals; Chlorine; Density; Electrons; Etching; Gases; Physics; Plasma applications; Plasma chemistry; Plasma density; Plasma simulation; Plasma sources; Plasma temperature; Plasma transport processes; Simulation