Lim, S. H. N., McCulloch, D. G., Bilek, M. M. M., & McKenzie, D. R. (2003). Relation between microstructure and stress in titanium nitride films grown by plasma immersion ion implantation. Journal of applied physics, 93(7), 4283-4288. https://doi.org/10.1063/1.1558995
Chicago Style (17th ed.) CitationLim, S. H. N., D. G. McCulloch, M. M. M. Bilek, and D. R. McKenzie. "Relation Between Microstructure and Stress in Titanium Nitride Films Grown by Plasma Immersion Ion Implantation." Journal of Applied Physics 93, no. 7 (2003): 4283-4288. https://doi.org/10.1063/1.1558995.
MLA (9th ed.) CitationLim, S. H. N., et al. "Relation Between Microstructure and Stress in Titanium Nitride Films Grown by Plasma Immersion Ion Implantation." Journal of Applied Physics, vol. 93, no. 7, 2003, pp. 4283-4288, https://doi.org/10.1063/1.1558995.