Sensitive properties of In-based compound semiconductor oxide to Cl2 gas

Aiming at detecting Cl2 gas, this study was made on how to make In-based compound semiconductor oxide gas sensor. The micro-property and sensitivity of In-based gas sensing material were analyzed and its gas sensitive mechanism was also discussed. Adopting constant temperature chemical coprecipitati...

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Published inJournal of semiconductors Vol. 30; no. 3; pp. 83 - 86
Main Author 赵文杰 施云波 修德斌 雷廷平 冯侨华 王立全
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.03.2009
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ISSN1674-4926
DOI10.1088/1674-4926/30/3/034010

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Summary:Aiming at detecting Cl2 gas, this study was made on how to make In-based compound semiconductor oxide gas sensor. The micro-property and sensitivity of In-based gas sensing material were analyzed and its gas sensitive mechanism was also discussed. Adopting constant temperature chemical coprecipitation, the compound oxides such as In-Nb, In-Cd and In-Mg were synthesized, respectively. The products were sintered at 600 ℃ and characterized by the Scanning Electron Microscope (SEM), showing the grain size almost about 50-60 nm. The test results show that the sensitivities of In-Nb, In-Cd and In-Mg materials under the concentration of 50 × 10^-6 in Cl2 gas are above 100 times, 4 times and 10 times, respectively. The response time of In-Nb, In-Cd and In-Mg materials is about 30, 60 and 30 s, and the recovery time less than 2, 10 and 2 min, respectively. Among them, the In-Nb material was found to have a relatively high conductivity and ideal sensitivity to Cl2 gas, which showed rather good selectivity and stability, and could detect the minimum concentration of 0.5 × 10^-6 with the sensitivity of 2.2, and the upper limit concentration of 500 × 10^-6. The power loss of the device is around 220 mW under the heating voltage of 3 V.
Bibliography:TP212
In2O3
TN16
In2O3; Nb2O5, sensitive property; chlorine gas sensor
chlorine gas sensor
Nb2O5, sensitive property
11-5781/TN
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SourceType-Scholarly Journals-1
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content type line 23
ISSN:1674-4926
DOI:10.1088/1674-4926/30/3/034010