APA (7th ed.) Citation

张玉峰, 段. 周. 刘. 王. (2014). Investigation on surface roughness in chemical mechanical polishing of TiO2 thin film. 半导体学报:英文版, 6, 10-13. https://doi.org/10.1088/1674-4926/35/6/063003

Chicago Style (17th ed.) Citation

张玉峰, 段波 周建伟 刘玉岭 王辰伟. "Investigation on Surface Roughness in Chemical Mechanical Polishing of TiO2 Thin Film." 半导体学报:英文版 6 (2014): 10-13. https://doi.org/10.1088/1674-4926/35/6/063003.

MLA (9th ed.) Citation

张玉峰, 段波 周建伟 刘玉岭 王辰伟. "Investigation on Surface Roughness in Chemical Mechanical Polishing of TiO2 Thin Film." 半导体学报:英文版, 6, 2014, pp. 10-13, https://doi.org/10.1088/1674-4926/35/6/063003.

Warning: These citations may not always be 100% accurate.