APA (7th ed.) Citation

Agrawal, A., Kumar, A., & Panwar, R. (2024). Deep Learning and ECM Fusion for Realization of Advanced Resistive Ink FSS-Based Customized Microwave Absorber. IEEE journal on electromagnetic compatibility practice and applications, 6(4), 132-137. https://doi.org/10.1109/LEMCPA.2024.3458790

Chicago Style (17th ed.) Citation

Agrawal, Anjali, Anil Kumar, and Ravi Panwar. "Deep Learning and ECM Fusion for Realization of Advanced Resistive Ink FSS-Based Customized Microwave Absorber." IEEE Journal on Electromagnetic Compatibility Practice and Applications 6, no. 4 (2024): 132-137. https://doi.org/10.1109/LEMCPA.2024.3458790.

MLA (9th ed.) Citation

Agrawal, Anjali, et al. "Deep Learning and ECM Fusion for Realization of Advanced Resistive Ink FSS-Based Customized Microwave Absorber." IEEE Journal on Electromagnetic Compatibility Practice and Applications, vol. 6, no. 4, 2024, pp. 132-137, https://doi.org/10.1109/LEMCPA.2024.3458790.