Total dry electron-beam vacuum lithography system for a rotary encoder

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Bibliographic Details
Published inShinku
Format Journal Article
LanguageEnglish
Japanese
Online AccessGet full text
ISSN1880-9413
0559-8516
DOI10.3131/jvsj.30.391

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ISSN:1880-9413
0559-8516
DOI:10.3131/jvsj.30.391