胡增顺, 唐. 周. 郑. 魏. 成. 叶. (2007). Microstructure and electrical properties of CeO2 ultra-thin films for MFIS FeRAM applications. Transactions of Nonferrous Metals Society of China, 17(A02), 741-746.
Chicago Style (17th ed.) Citation胡增顺, 唐明华 周益春 郑学军 魏秋平 成传品 叶志. "Microstructure and Electrical Properties of CeO2 Ultra-thin Films for MFIS FeRAM Applications." Transactions of Nonferrous Metals Society of China 17, no. A02 (2007): 741-746.
MLA (9th ed.) Citation胡增顺, 唐明华 周益春 郑学军 魏秋平 成传品 叶志. "Microstructure and Electrical Properties of CeO2 Ultra-thin Films for MFIS FeRAM Applications." Transactions of Nonferrous Metals Society of China, vol. 17, no. A02, 2007, pp. 741-746.
Warning: These citations may not always be 100% accurate.