Search Results - "strain and defect" :: K.UTB vyhledávací portál

Correlation between strain and defects in Bi implanted Si

by Palade, C., Lepadatu, A.-M., Slav, A., Ciurea, M.L., Lazanu, S.
Published in The Journal of physics and chemistry of solids (01.06.2016)

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Waveguide, apparatus including the waveguide, and method of manufacturing the waveguide

by KOYAMA YASUSHI
Year of Publication 14.04.2015

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Waveguide, apparatus including the waveguide, and method of manufacturing the waveguide

by KOYAMA, YASUSHI
Year of Publication 21.11.2012

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WAVEGUIDE, APPARATUS INCLUDING THE WAVEGUIDE, AND METHOD OF MANUFACTURING THE WAVEGUIDE

by KOYAMA YASUSHI
Year of Publication 22.11.2012

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Light-Cured Junction Formation and Broad-Band Imaging Application in Thermally Mismatched van der Waals Heterointerface

by Cheng, Liyuan, Quan, Qinglin, Hu, Liang
Published in Materials (11.08.2024)

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Waveguide, apparatus including the waveguide, and method of manufacturing the waveguide

by KOYAMA YASUSHI
Year of Publication 21.11.2012

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Patent

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Structural, electronic and adsorptive characteristics of phosphorated holey graphene (PHG): First principles calculations

by Shi, Li-Bin, Zhang, Yan-Yan, Xiu, Xiao-Ming, Dong, Hai-Kuan
Published in Diamond and related materials (01.02.2018)

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Shock-Induced Structural Change and its Application to a Material Development and Processing

by KISHIMURA, Hiroaki
Published in The Review of High Pressure Science and Technology (2021)

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衝撃圧縮により誘起される物質変化とその材料創製への応用

by 岸村, 浩明
Published in 高圧力の科学と技術 (2021)

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Morphology of RuO2(110) Films during Electrochemistry

by Reese, Austin Jerad, Wadehra, Neha, Suntivich, Jin, Schlom, Darrell
Published in Meeting abstracts (Electrochemical Society) (22.12.2023)

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Method of manufacturing semiconductor monocrystalline mirror-surface wafers which includes a gas phase etching process, and semiconductor monocrystalline mirror-surface wafers manufactured by the method

by OISHI, HIROSHI
Year of Publication 07.06.2001

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Method of manufacturing semiconductor monocrystalline mirror-surface wafers which includes a gas phase etching process, and semiconductor monocrystalline mirror-surface wafers manufactured by the method

by OISHI; HIROSHI
Year of Publication 09.11.1999

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Method for forming high yield epitaxial wafers

by GARBIS; DANNY, LATERZA; LAWRENCE E, GRANATA; AMADEO J, CHAN; JOSEPH J, CONIGLIONE; PHILIP, BRIGLIA; THOMAS D
Year of Publication 21.04.1987

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